Engineering the grain boundary network of thin films via ion-irradiation: Towards improved electromigration resistance

Ma H, La Mattina F, Shorubalko I, Spolenak R & Seita M
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Ma, H., La Mattina, F., Shorubalko, I., Spolenak, R., & Seita, M. (2017). Engineering the grain boundary network of thin films via ion-irradiation: Towards improved electromigration resistance. Acta Materialia, 123, 272-284. https://doi.org/10.1016/j.actamat.2016.10.040