Interaction of ALD deposited Al&lt;sub&gt;2&lt;/sub&gt;0&lt;sub&gt;3&lt;/sub&gt; films with remote fluorine plasma

Ruoho, Mikko; Guerra-Nuñez, Carlos; Polyakov, Mikhail; Maeder, Xavier; Spring, Philip; Andreaus, Bernhard; Utke, Ivo

Interaction of ALD deposited Al₂0₃ films with remote fluorine plasma

Ruoho M, Guerra-Nuñez C, Polyakov M, Maeder X, Spring P, Andreaus B & Utke I

Citation

Ruoho, M., Guerra-Nuñez, C., Polyakov, M., Maeder, X., Spring, P., Andreaus, B., & Utke, I. (2017). Interaction of ALD deposited Al₂0₃ films with remote fluorine plasma. Presented at the E-MRS fall meeting 2017. Warsaw, Poland: E-MRS.

Persistent URL https://www.dora.lib4ri.ch/empa/islandora/object/empa:15045

Details

Publication Type

Conference Item

Title

Interaction of ALD deposited Al₂0₃ films with remote fluorine plasma

Author(s)

Ruoho, Mikko (206 Mechanics of Materials and Nanostructures)

Guerra-Nuñez, Carlos (206 Mechanics of Materials and Nanostructures)

Polyakov, Mikhail (206 Mechanics of Materials and Nanostructures)

Maeder, Xavier (206 Mechanics of Materials and Nanostructures)

Spring, Philip

Andreaus, Bernhard

Utke, Ivo (206 Mechanics of Materials and Nanostructures)

Editor(s)

(editor)

Publisher

E-MRS

Publication Year

2017

Conference

E-MRS fall meeting 2017

Conference Place

Warsaw, Poland

Conference Date

September 18-21, 2017

Additional Information

poster

Interaction of ALD deposited Al203 films with remote fluorine plasma

Interaction of ALD deposited Al₂0₃ films with remote fluorine plasma