A robust metal oxide thin film with cryogenic saturation magnetization exceeding 2 Tesla

Trepka K, Hauert R, Cancellieri C & Tao Y
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Trepka, K., Hauert, R., Cancellieri, C., & Tao, Y. (2020). A robust metal oxide thin film with cryogenic saturation magnetization exceeding 2 Tesla. Matter, 3(4), 1263-1274. https://doi.org/10.1016/j.matt.2020.07.031