TiN-buffered substrates for photoelectrochemical measurements of oxynitride thin films

Pichler M, Pergolesi D, Landsmann S, Chawla V, Michler J, Döbeli M, Wokaun A & Lippert T
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Pichler, M., Pergolesi, D., Landsmann, S., Chawla, V., Michler, J., Döbeli, M., … Lippert, T. (2016). TiN-buffered substrates for photoelectrochemical measurements of oxynitride thin films. Applied Surface Science, 369, 67-75. https://doi.org/10.1016/j.apsusc.2016.01.197