Near-infrared light-sensitive polyvinyl alcohol hydrogel photoresist for spatiotemporal control of cell-instructive 3D microenvironments

Qin X-H, Wang X, Rottmar M, Nelson BJ & Maniura-Weber K
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Qin, X. H., Wang, X., Rottmar, M., Nelson, B. J., & Maniura-Weber, K. (2018). Near-infrared light-sensitive polyvinyl alcohol hydrogel photoresist for spatiotemporal control of cell-instructive 3D microenvironments. Advanced Materials, 30(10), 1705564 (7 pp.). https://doi.org/10.1002/adma.201705564