Low temperature silicon dioxide by thermal atomic layer deposition: investigation of material properties

Hiller D, Zierold R, Bachmann J, Alexe M, Yang Y, Gerlach JW, Stesmans A, Jivanescu M, Müller U, Vogt J, Hilmer H, Löper P, Künle M, Munnik F, Nielsch K & Zacharias M
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Hiller, D., Zierold, R., Bachmann, J., Alexe, M., Yang, Y., Gerlach, J. W., … Zacharias, M. (2010). Low temperature silicon dioxide by thermal atomic layer deposition: investigation of material properties. Journal of Applied Physics, 107(6), 064314 (10 pp.). https://doi.org/10.1063/1.3327430