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A simple method for measuring plasma power in rf-GDOES instruments
Nelis, T., Aeberhard, M., Rohr, L., Michler, J., Belenguer, P., Guillot, P., & Thérèse, L. (2007). A simple method for measuring plasma power in rf-GDOES instruments. Analytical and Bioanalytical Chemistry, 389(3), 763-767. https://doi.org/10.1007/s00216-007-1509-3
Characterisation of a pulsed rf-glow discharge in view of its use in OES
Nelis, T., Aeberhard, M., Hohl, M., Rohr, L., & Michler, J. (2006). Characterisation of a pulsed rf-glow discharge in view of its use in OES. Journal of Analytical Atomic Spectrometry, 21(2), 112-125. https://doi.org/10.1039/b513279g
Combinatorial materials design approach to investigate adhesion layer chemistry for optimal interfacial adhesion strength
Schoeppner, R. L., Putz, B., Taylor, A. A., Pethö, L., Thomas, K., Antonin, O., … Michler, J. (2021). Combinatorial materials design approach to investigate adhesion layer chemistry for optimal interfacial adhesion strength. Crystals, 11(4), 357 (17 pp.). https://doi.org/10.3390/cryst11040357
Glow discharge as a tool for surface and interface analysis
Nelis, T., & Pallosi, J. (2006). Glow discharge as a tool for surface and interface analysis. Applied Spectroscopy Reviews, 41(3), 227-258. https://doi.org/10.1080/05704920600620345
Modelling the RF source in GDOES
Payling, R., Bonnot, O., Fretel, E., Rogerieux, O., Aeberhard, M., Michler, J., … Guillot, P. (2003). Modelling the RF source in GDOES. Journal of Analytical Atomic Spectrometry, 18, 656-664. https://doi.org/10.1039/b301156a
Nano crystalline diamond microwave chemical vapor deposition growth on three dimension structured silicon substrates at low temperature
Antonin, O., Schoeppner, R., Gabureac, M., Pethö, L., Michler, J., Raynaud, P., & Nelis, T. (2018). Nano crystalline diamond microwave chemical vapor deposition growth on three dimension structured silicon substrates at low temperature. Diamond and Related Materials, 83, 67-74. https://doi.org/10.1016/j.diamond.2018.01.007
New tool for fast and precise chemical analysis of thin oxide layers: pulsed rf-glow-discharge time-of-flight mass spectrometry
Hohl, M., Nelis, T., Michler, J., Tanner, C., Gonin, M., & Fuhrer, K. (2007). New tool for fast and precise chemical analysis of thin oxide layers: pulsed rf-glow-discharge time-of-flight mass spectrometry. Presented at the 12th European conference on applications of surface and interface analysis (ECASIA 2007). Brussels, Belgium.
Point sur les SDL: spectromètres à décharges luminescentes
Nelis, T. (2006). Point sur les SDL: spectromètres à décharges luminescentes. Gazette du vide (11), 14-15.
Pulsed r.f.-glow-discharge time-of-flight mass spectrometry for fast surface and interface analysis of conductive and non-conductive materials
Hohl, M., Kanzari, A., Michler, J., Nelis, T., Fuhrer, K., & Gonin, M. (2006). Pulsed r.f.-glow-discharge time-of-flight mass spectrometry for fast surface and interface analysis of conductive and non-conductive materials. Surface and Interface Analysis, 38(4), 292-295. https://doi.org/10.1002/sia.2253
Rapid depth profiling of lead zirconate titanate (PZT) thin films by pulsed glow-discharge optical emission spectroscopy
Schwaller, P., Aeberhard, M., Nelis, T., Fischer, A., Thapliyal, R., & Michler, J. (2006). Rapid depth profiling of lead zirconate titanate (PZT) thin films by pulsed glow-discharge optical emission spectroscopy. Surface and Interface Analysis, 38(4), 757-760. https://doi.org/10.1002/sia.2264
Relative calibration mode for compositional depth profiling in GD-OES
Nelis, T., Aeberhard, M., Payling, R., Michler, J., & Chapon, P. (2004). Relative calibration mode for compositional depth profiling in GD-OES. Journal of Analytical Atomic Spectrometry, 19, 1354-1360. https://doi.org/10.1039/b406187j
The concept of constant emission yield in GDOES
Bengtson, A., & Nelis, T. (2006). The concept of constant emission yield in GDOES. Analytical and Bioanalytical Chemistry, 385(3), 568-585. https://doi.org/10.1007/s00216-006-0412-7
Theory of relative sputtering rates in GDOES
Payling, R., Aeberhard, M., Michler, J., Authier, C., Chapon, P., Nelis, T., & Pitchford, L. (2003). Theory of relative sputtering rates in GDOES. Surface and Interface Analysis, 35(4), 334-339. https://doi.org/10.1002/sia.1536
Universell, schnell, präzise. Tiefenprofil-Analysen mit der Glimmentladungs-Spektrometrie
Aeberhard, M., Michler, J., & Nelis, T. (2006). Universell, schnell, präzise. Tiefenprofil-Analysen mit der Glimmentladungs-Spektrometrie. JOT Journal für Oberflächentechnik, 46(7), 40-44.