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A novel copper precursor for electron beam induced deposition
Haverkamp, C., Sarau, G., Polyakov, M. N., Utke, I., Puydinger dos Santos, M. V., Christiansen, S., & Höflich, K. (2018). A novel copper precursor for electron beam induced deposition. Beilstein Journal of Nanotechnology, 9(1), 1220-1227. https://doi.org/10.3762/bjnano.9.113