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Microstructure and ferroelectricity of BaTiO<SUB>3</SUB> thin films on Si for integrated photonics
Kormondy, K. J., Popoff, Y., Sousa, M., Eltes, F., Caimi, D., Rossell, M. D., … Abel, S. (2017). Microstructure and ferroelectricity of BaTiO3 thin films on Si for integrated photonics. Nanotechnology, 28(7), 075706 (10 pp.). https://doi.org/10.1088/1361-6528/aa53c2
Low temperature epitaxial barium titanate thin film growth in high vacuum CVD
Reinke, M., Kuzminykh, Y., Eltes, F., Abel, S., LaGrange, T., Neels, A., … Hoffmann, P. (2017). Low temperature epitaxial barium titanate thin film growth in high vacuum CVD. Advanced Materials Interfaces, 1700116 (8 pp.). https://doi.org/10.1002/admi.201700116
Surface reaction kinetics of titanium isopropoxide and water in atomic layer deposition
Reinke, M., Kuzminykh, Y., & Hoffmann, P. (2016). Surface reaction kinetics of titanium isopropoxide and water in atomic layer deposition. Journal of Physical Chemistry C, 120(8), 4337-4344. https://doi.org/10.1021/acs.jpcc.5b10529
Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO<SUB>3</SUB>
Reinke, M., Kuzminykh, Y., & Hoffmann, P. (2015). Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3. Physica Status Solidi A: Applications and Materials, 212(7), 1556-1562. https://doi.org/10.1002/pssa.201532326
Combinatorial characterization of TiO<SUB>2</SUB> chemical vapor deposition utilizing titanium isopropoxide
Reinke, M., Ponomarev, E., Kuzminykh, Y., & Hoffmann, P. (2015). Combinatorial characterization of TiO2 chemical vapor deposition utilizing titanium isopropoxide. ACS Combinatorial Science, 17(7), 413-420. https://doi.org/10.1021/acscombsci.5b00040
Low temperature chemical vapor deposition using atomic layer deposition chemistry
Reinke, M., Kuzminykh, Y., & Hoffmann, P. (2015). Low temperature chemical vapor deposition using atomic layer deposition chemistry. Chemistry of Materials, 27(5), 1604-1611. https://doi.org/10.1021/cm504216p
Selective area high vacuum chemical vapor deposition of Titania on functionalized surfaces
Reinke, M., Kuzminykh, Y., & Hoffmann, P. (2015). Selective area high vacuum chemical vapor deposition of Titania on functionalized surfaces. Presented at the EuroCVD 20. Sempach, Schweiz.
Selective growth of titanium dioxide by low-temperature chemical vapor deposition
Reinke, M., Kuzminykh, Y., & Hoffmann, P. (2015). Selective growth of titanium dioxide by low-temperature chemical vapor deposition. ACS Applied Materials and Interfaces, 7(18), 9736-9743. https://doi.org/10.1021/acsami.5b01561
Surface kinetics of titanium isopropoxide in high vacuum chemical vapor deposition
Reinke, M., Kuzminykh, Y., & Hoffmann, P. (2015). Surface kinetics of titanium isopropoxide in high vacuum chemical vapor deposition. Journal of Physical Chemistry C, 119(50), 27965-27971. https://doi.org/10.1021/acs.jpcc.5b07177
Limitations of patterning thin films by shadow mask high vacuum chemical vapor deposition
Reinke, M., Kuzminykh, Y., & Hoffmann, P. (2014). Limitations of patterning thin films by shadow mask high vacuum chemical vapor deposition. Thin Solid Films, 563, 56-61. https://doi.org/10.1016/j.tsf.2014.02.088
Complex decomposition behaviour of Cu(TMHD)&lt;sub&gt;2&lt;/sub&gt; precursor in high vacuum CVD process: combinatoprial Co-depositon with Ti-Isopropoxide
Kuzminykh, Y., Reinke, M., Cosmin Sandu, S., Benvenuti, G., & Hoffmann, P. (2013). Complex decomposition behaviour of Cu(TMHD)2 precursor in high vacuum CVD process: combinatoprial Co-depositon with Ti-Isopropoxide. Presented at the EuroCVD 19. Varna, Bulgaria.
High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection
Kuzminykh, Y., Dabirian, A., Reinke, M., & Hoffmann, P. (2013). High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection. Surface and Coatings Technology, 230, 13-21. https://doi.org/10.1016/j.surfcoat.2013.06.059
Combinatorial HV-CVD of oxide thin films for integrated photonic circuits
Reinke, M., Dabirian, A., Kuzminykh, Y., & Hoffmann, P. (2013). Combinatorial HV-CVD of oxide thin films for integrated photonic circuits.
Limitations of geometrically controlled growth of TiO&lt;sub&gt;2&lt;/sub&gt; films by hard shadow mask HV-CVD
Reinke, M., Kuzminykh, Y., & Hoffmann, P. (2013). Limitations of geometrically controlled growth of TiO2 films by hard shadow mask HV-CVD. Presented at the EuroCVD 19. Varna, Bulgaria.
Precursor adsorption efficiency of titanium tetra isopropoxide in the presence of a barium β-diketonate precursor
Reinke, M., Kuzminykh, Y., Malandrino, G., & Hoffmann, P. (2013). Precursor adsorption efficiency of titanium tetra isopropoxide in the presence of a barium β-diketonate precursor. Surface and Coatings Technology, 230, 297-304. https://doi.org/10.1016/j.surfcoat.2013.06.016
Deposition of oxide filmes by high vacuum chemical vapor deposition
Reinke, M., Dabirian, A., Kuzminykh, Y., & Hoffmann, P. (2012). Deposition of oxide filmes by high vacuum chemical vapor deposition. Presented at the EMRS spring meeting 2012. Lausanne, Switzerland.
Deposition of oxide films by high vacuum chemical vapor deposition
Reinke, M., Dabirian, A., Multone, X., Kuzminykh, Y., & Hoffmann, P. (2012). Deposition of oxide films by high vacuum chemical vapor deposition. Presented at the E-MRS 2012 spring meeting. Strasbourg, France.