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High sensitivity of fluorine gas-assisted FIB-TOF-SIMS for chemical characterization of buried sublayers in thin films
Priebe, A., Pethö, L., Huszar, E., Xie, T., Utke, I., & Michler, J. (2021). High sensitivity of fluorine gas-assisted FIB-TOF-SIMS for chemical characterization of buried sublayers in thin films. ACS Applied Materials and Interfaces, 13(13), 15890-15900. https://doi.org/10.1021/acsami.1c01627