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  • (-) Empa Laboratories = 405 Transport at Nanoscale Interfaces
  • (-) Publication Year = 2006 - 2019
  • (-) Journal ≠ Journal of Applied Physics
  • (-) Journal = Microelectronic Engineering
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Analysis of the propagation losses of InP/InGaAsP trench waveguides fabricated by focused ion beam
Callegari, V., Sennhauser, U., & Jäckel, H. (2010). Analysis of the propagation losses of InP/InGaAsP trench waveguides fabricated by focused ion beam. Microelectronic Engineering, 87(11), 2061-2064. https://doi.org/10.1016/j.mee.2009.12.080
Metal direct nanoimprinting for photonics
Buzzi, S., Robin, F., Callegari, V., & Löffler, J. F. (2008). Metal direct nanoimprinting for photonics. Microelectronic Engineering, 85(2), 419-424. https://doi.org/10.1016/j.mee.2007.08.001
Silicon Fresnel zone plates for high heat load X-ray microscopy
Vila-Comamala, J., Jefimovs, K., Raabe, J., Kaulich, B., & David, C. (2008). Silicon Fresnel zone plates for high heat load X-ray microscopy. Microelectronic Engineering, 85(5-6), 1241-1244. https://doi.org/10.1016/j.mee.2008.01.023
Focused ion beam modifications of indium phosphide photonic crystals
Nellen, P. M., Strasser, P., Callegari, V., Wüest, R., Erni, D., & Robin, F. (2007). Focused ion beam modifications of indium phosphide photonic crystals. Microelectronic Engineering, 84(5-8), 1244-1247. https://doi.org/10.1016/j.mee.2007.01.037
FIB-milling of photonic structures and sputtering simulation
Nellen, P. M., Callegari, V., & Brönnimann, R. (2006). FIB-milling of photonic structures and sputtering simulation. Microelectronic Engineering, 83(4-9), 1805-1808. https://doi.org/10.1016/j.mee.2006.01.176