Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography

Frommhold A, Yang D, McClelland A, Xue X, Ekinci Y, Palmer RE & Robinson APG
Choose the citation style.
Frommhold, A., Yang, D., McClelland, A., Xue, X., Ekinci, Y., Palmer, R. E., & Robinson, A. P. G. (2013). Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 12(3), 033010 (6 pp.). https://doi.org/10.1117/1.JMM.12.3.033010