Self-assembly morphology of block copolymers in sub-10 nm topographical guiding patterns

Gottlieb S, Rösner B, Evangelio L, Fernández-Regúlez M, Nogales A, García-Gutiérrez MC, Keller TF, Fraxedas J, Ezquerra TA, David C & Perez-Murano F
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Gottlieb, S., Rösner, B., Evangelio, L., Fernández-Regúlez, M., Nogales, A., García-Gutiérrez, M. C., … Perez-Murano, F. (2019). Self-assembly morphology of block copolymers in sub-10 nm topographical guiding patterns. Molecular Systems Design & Engineering, 4(1), 175-185. https://doi.org/10.1039/c8me00046h