A high-brightness accelerator-based EUV source for metrology applications

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Ekinci, Y., Garvey, T., Streun, A., Wrulich, A., & Rivkin, L. (2018). A high-brightness accelerator-based EUV source for metrology applications. In E. E. Gallagher & J. H. Rankin (Eds.), Proceedings of SPIE: Vol. 10810. Photomask technology 2018 (p. 108100W (9 pp.). https://doi.org/10.1117/12.2501930