Fourier ptychography for lithography high NA systems

Dejkameh A, Erdmann A, Evanschitzky P & Ekinci Y
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Dejkameh, A., Erdmann, A., Evanschitzky, P., & Ekinci, Y. (2018). Fourier ptychography for lithography high NA systems. In D. G. Smith, F. Wyrowski, & A. Erdmann (Eds.), Proceedings of SPIE: Vol. 10694. Computational optics II (p. 106940B (10 pp.). https://doi.org/10.1117/12.2311332