Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists

Castellanos S, Wu L, Baljozovic M, Portale G, Kazazis D, Vockenhuber M, Ekinci Y & Jung T
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Castellanos, S., Wu, L., Baljozovic, M., Portale, G., Kazazis, D., Vockenhuber, M., … Jung, T. (2018). Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10583. Extreme ultraviolet (EUV) lithography IX (p. 105830A (12 pp.). https://doi.org/10.1117/12.2297167