Mechanistic insights in Zr- and Hf-based molecular hybrid EUV photoresists

Wu L, Baljozovic M, Portale G, Kazazis D, Vockenhuber M, Jung T, Ekinci Y & Castellanos S
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Wu, L., Baljozovic, M., Portale, G., Kazazis, D., Vockenhuber, M., Jung, T., … Castellanos, S. (2019). Mechanistic insights in Zr- and Hf-based molecular hybrid EUV photoresists. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013504 (10 pp.). https://doi.org/10.1117/1.JMM.18.1.013504