Absorber and phase defect inspection on EUV reticles using RESCAN

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Mochi, I., Fernandez, S., Nebling, R., Locans, U., Helfenstein, P., Rajeev, R., … Ekinci, Y. (2019). Absorber and phase defect inspection on EUV reticles using RESCAN. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme Ultraviolet (EUV) lithography X (p. 109570W (8 pp.). https://doi.org/10.1117/12.2515160