Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters

Thakur N, Tseng L-T, Vockenhuber M, Ekinci Y & Castellanos S
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Thakur, N., Tseng, L. T., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2019). Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters. Journal of Microlithography, Microfabrication, and Microsystems, 18(4), 043504 (10 pp.). https://doi.org/10.1117/1.JMM.18.4.043504