Progress overview of EUV resists status towards high-NA EUV lithography

Wang X, Tseng L-T, Mochi I, Vockenhuber M, van Lent-Protasova L, Custers R, Rispens G, Hoefnagels R & Ekinci Y
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Wang, X., Tseng, L. T., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Custers, R., … Ekinci, Y. (2019). Progress overview of EUV resists status towards high-NA EUV lithography. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 1114711 (10 pp.). https://doi.org/10.1117/12.2536923