Illumination control in lensless imaging for EUV mask inspection and review

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Mochi, I., Kim, H. S., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., & Ekinici, Y. (2020). Illumination control in lensless imaging for EUV mask inspection and review. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11323. Extreme ultraviolet (EUV) lithography XI (p. 113231I (9 pp.). https://doi.org/10.1117/12.2552014