Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography

Dieleman CD, Ding W, Wu L, Thakur N, Bespalov I, Daiber B, Ekinci Y, Castellanos S & Ehrler B
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Dieleman, C. D., Ding, W., Wu, L., Thakur, N., Bespalov, I., Daiber, B., … Ehrler, B. (2020). Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography. Nanoscale, 12(20), 11306-11316. https://doi.org/10.1039/d0nr01077d