Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging

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Nebling, R., Kim, H. S., Locans, U., Dejkameh, A., Ekinci, Y., & Mochi, I. (2020). Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11517. Extreme Ultraviolet Lithography 2020 (p. 115170W (6 pp.). https://doi.org/10.1117/12.2573181