Lensless EUV mask inspection for anamorphic patterns

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Mochi, I., Kim, H. S., Dejkameh, A., Nebling, R., Dimitrios, K., Locans, U., … Ekinci, Y. (2021). Lensless EUV mask inspection for anamorphic patterns. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090M (6 pp.). https://doi.org/10.1117/12.2584518