Chemically-amplified backbone scission (CABS) resist for EUV lithography.

Choose the citation style.
Manouras, T., Kazazis, D., & Ekinci, Y. (2021). Chemically-amplified backbone scission (CABS) resist for EUV lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 11609H (9 pp.). https://doi.org/10.1117/12.2584085