In prior work, progress was shown in the systematic characterization of the process space for efficient and effective repair of extreme ultraviolet (EUV) photomasks using an ultrafast (femtosecond) pulsed deep ultraviolet (DUV) laser apparatus. In this work, the full analysis and conclusions, along with any additional test results are shown. This includes an analysis of the impact of laser repair on the phase shift of the multilayer using multiple processes.