Progress in EUV resist screening by interference lithography for high-NA lithography

Allenet T, Vockenhuber M, Yeh C-K, Kazazis D, Santaclara JG, van Lent-Protasova L & Ekinci Y
Choose the citation style.
Allenet, T., Vockenhuber, M., Yeh, C. K., Kazazis, D., Santaclara, J. G., van Lent-Protasova, L., & Ekinci, Y. (2021). Progress in EUV resist screening by interference lithography for high-NA lithography. In T. Allenet, M. Vockenhuber, C. K. Yeh, D. Kazazis, J. Garcia-Santaclara, L. van Lent-Protasova, … E. Hendrickx (Eds.), Proceedings of SPIE: Vol. 11854. International conference on extreme ultraviolet lithography 2021 (p. 118540N (10 pp.). https://doi.org/10.1117/12.2600963