Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by Si deep reactive ion etching and bottom-up Au electroplating

Shi Z, Josell D, Jefimovs K, Romano L, Moffat TP, Stampanoni M & Schleputz CM
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Shi, Z., Josell, D., Jefimovs, K., Romano, L., Moffat, T. P., Stampanoni, M., & Schleputz, C. M. (2022). Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by Si deep reactive ion etching and bottom-up Au electroplating. Applied Optics, 61(13), 3850-3854. https://doi.org/10.1364/AO.456427