Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist

Cattoni A, Mailly D, Dalstein O, Faustini M, Seniutinas G, Rösner B & David C
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Cattoni, A., Mailly, D., Dalstein, O., Faustini, M., Seniutinas, G., Rösner, B., & David, C. (2018). Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist. Microelectronic Engineering, 193, 18-22. https://doi.org/10.1016/j.mee.2018.02.015