Photoacid generator-polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography

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Fallica, R., & Ekinci, Y. (2018). Photoacid generator-polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography. Journal of Materials Chemistry C, 6(27), 7267-7273. https://doi.org/10.1039/c8tc01446a