Chemical patterning of sub-50-nm half pitches via nanoimprint lithography

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Park, S., Saxer, S., Padeste, C., Solak, H. H., Gobrecht, J., & Schift, H. (2005). Chemical patterning of sub-50-nm half pitches via nanoimprint lithography. Microelectronic Engineering, 78-79(1-4), 682-688. https://doi.org/10.1016/j.mee.2004.12.085