Editorial for the special issue on recent advances in reactive ion etching and applications of high-aspect-ratio microfabrication

Romano L & Jefimovs K
Choose the citation style.
Romano, L., & Jefimovs, K. (2023). Editorial for the special issue on recent advances in reactive ion etching and applications of high-aspect-ratio microfabrication. Micromachines, 14(8), 1630 (2 pp.). https://doi.org/10.3390/mi14081630
https://www.dora.lib4ri.ch/psi/islandora/object/psi:54475
Details
Publication Type

Journal Article

Title

Editorial for the special issue on recent advances in reactive ion etching and applications of high-aspect-ratio microfabrication

Author(s)

Romano, Lucia (6111 X-ray Tomography)

Jefimovs, Konstantins (6711 Nanotechnology)

Journal

Micromachines

Volume

14

Issue

8

Start Page

1630 (2 pp.)

Publication Year

2023

Peer Review

Yes

Collection

PSI Publications
Open Access

Additional Information

#other_journal_contribution: editorial