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Analysis of 4H-SiC MOS capacitors on macro-stepped surfaces
Camarda, M., Woerle, J., Souliere, V., Ferro, G., Sigg, H., Grossner, U., & Gobrecht, J. (2017). Analysis of 4H-SiC MOS capacitors on macro-stepped surfaces. In K. Zekentes, K. V. Vasilevskiy, & N. Frangis (Eds.), Materials science forum: Vol. 897. Silicon carbide and related materials 2016 (pp. 107-110). https://doi.org/10.4028/www.scientific.net/MSF.897.107
Catalyst support effects on hydrogen spillover
Karim, W., Spreafico, C., Kleibert, A., Gobrecht, J., VandeVondele, J., Ekinci, Y., & van Bokhoven, J. A. (2017). Catalyst support effects on hydrogen spillover. Nature, 541(7635), 68-71. https://doi.org/10.1038/nature20782
Protective effect of ultrathin alumina film against diffusion of iron into carbon fiber during growth of carbon nanotubes for hierarchical composites investigated by ptychographic X-ray computed tomography
Szmyt, W., Vogel, S., Diaz, A., Holler, M., Gobrecht, J., Calame, M., & Dransfeld, C. (2017). Protective effect of ultrathin alumina film against diffusion of iron into carbon fiber during growth of carbon nanotubes for hierarchical composites investigated by ptychographic X-ray computed tomography. Carbon, 115, 347-362. https://doi.org/10.1016/j.carbon.2016.12.085
Analysis of thin thermal oxides on (0001) sic epitaxial layers
Woerle, J., Camarda, M., Schneider, C. W., Sigg, H., Grossner, U., & Gobrecht, J. (2017). Analysis of thin thermal oxides on (0001) sic epitaxial layers. In K. Zekentes, K. V. Vasilevskiy, & N. Frangis (Eds.), Materials science forum: Vol. 897. Silicon carbide and related materials 2016 (pp. 119-122). https://doi.org/10.4028/www.scientific.net/MSF.897.119
Electronic band structure of the buried SiO<sub>2</sub>/SiC interface investigated by soft x-ray ARPES
Woerle, J., Bisti, F., Husanu, M. A., Strocov, V. N., Schneider, C. W., Sigg, H., … Camarda, M. (2017). Electronic band structure of the buried SiO2/SiC interface investigated by soft x-ray ARPES. Applied Physics Letters, 110(13), 132101 (5 pp.). https://doi.org/10.1063/1.4979102
Scanning coherent scattering methods for actinic EUV mask inspection
Ekinci, Y., Helfenstein, P., Rajeev, R., Mochi, I., Mohacsi, I., Gobrecht, J., & Yoshitake, S. (2016). Scanning coherent scattering methods for actinic EUV mask inspection. In B. S. Kasprowicz & P. D. Buck (Eds.), Proceedings of SPIE: Vol. 9985. Photomask technology 2016 (p. 99851P (9 pp.). https://doi.org/10.1117/12.2242961
Size-dependent redox behavior of iron observed by <em>in-situ</em> single nanoparticle spectro-microscopy on well-defined model systems
Karim, W., Kleibert, A., Hartfelder, U., Balan, A., Gobrecht, J., van Bokhoven, J. A., & Ekinci, Y. (2016). Size-dependent redox behavior of iron observed by in-situ single nanoparticle spectro-microscopy on well-defined model systems. Scientific Reports, 6, 18818 (8 pp.). https://doi.org/10.1038/srep18818
Sub-wavelength printing in the deep ultra-violet region using Displacement Talbot Lithography
Wang, L., Clube, F., Dais, C., Solak, H. H., & Gobrecht, J. (2016). Sub-wavelength printing in the deep ultra-violet region using Displacement Talbot Lithography. Microelectronic Engineering, 161, 104-108. https://doi.org/10.1016/j.mee.2016.04.017
High-resolution and large-area nanoparticle arrays using EUV interference lithography
Karim, W., Tschupp, S. A., Oezaslan, M., Schmidt, T. J., Gobrecht, J., van Bokhoven, J. A., & Ekinci, Y. (2015). High-resolution and large-area nanoparticle arrays using EUV interference lithography. Nanoscale, 7(16), 7386-7393. https://doi.org/10.1039/C5NR00565E
Beyond EUV lithography: a comparative study of efficient photoresists&#039; performance
Mojarad, N., Gobrecht, J., & Ekinci, Y. (2015). Beyond EUV lithography: a comparative study of efficient photoresists' performance. Scientific Reports, 5, 9235 (7 pp.). https://doi.org/10.1038/srep09235
Interference lithography at EUV and soft X-ray wavelengths: principles, methods, and applications
Mojarad, N., Gobrecht, J., & Ekinci, Y. (2015). Interference lithography at EUV and soft X-ray wavelengths: principles, methods, and applications. Microelectronic Engineering, 143, 55-63. https://doi.org/10.1016/j.mee.2015.03.047
Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond
Mojarad, N., Hojeij, M., Wang, L., Gobrecht, J., & Ekinci, Y. (2015). Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond. Nanoscale, 7(9), 4031-4037. https://doi.org/10.1039/C4NR07420C
Device simulations on novel high channel mobility 4H-SiC trench MOSFETs and their fabrication processes
Rossmann, H. R., Bubendorf, A., Zanella, F., Marjanović, N., Schnieper, M., Meyer, E., … Bartolf, H. (2015). Device simulations on novel high channel mobility 4H-SiC trench MOSFETs and their fabrication processes. Microelectronic Engineering, 145, 166-169. https://doi.org/10.1016/j.mee.2015.07.002
Investigation of the dominant 1/&lt;em&gt;f&lt;/em&gt; noise source in silicon nanowire sensors
Bedner, K., Guzenko, V. A., Tarasov, A., Wipf, M., Stoop, R. L., Rigante, S., … Schönenberger, C. (2014). Investigation of the dominant 1/f noise source in silicon nanowire sensors. Sensors and Actuators B: Chemical, 191, 270-275. https://doi.org/10.1016/j.snb.2013.09.112
Ultra-dense silicon nanowires using extreme ultraviolet interference lithography
Fan, D., Sigg, H., Gobrecht, J., Ekinci, Y., & Spolenak, R. (2014). Ultra-dense silicon nanowires using extreme ultraviolet interference lithography. In P. Kallio (Ed.), 2014 international conference on manipulation, manufacturing and measurement on the nanoscale (3M-NANO). Conference proceedings (pp. 122-125). https://doi.org/10.1109/3M-NANO.2014.7057336
Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths
Mojarad, N., Fan, D., Gobrecht, J., & Ekinci, Y. (2014). Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths. Optics Letters, 39(8), 2286-2289. https://doi.org/10.1364/OL.39.002286
Nanoimprint lithography process chains for the fabrication of micro-and nanodevices
Schift, H., Urwyler, P., Kristiansen, P. M., & Gobrecht, J. (2014). Nanoimprint lithography process chains for the fabrication of micro-and nanodevices. Journal of Micro/Nanolithography, MEMS, and MOEMS, 13(3), 031303 (10 pp.). https://doi.org/10.1117/1.JMM.13.3.031303
High-throughput fabrication of compact and flexible bilayer nanowire grid polarizers for deep-ultraviolet to infrared range
Wang, L., Schift, H., Gobrecht, J., Ekinci, Y., Kristiansen, P. M., Solak, H. H., & Jefimovs, K. (2014). High-throughput fabrication of compact and flexible bilayer nanowire grid polarizers for deep-ultraviolet to infrared range. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 32(3), 031206. https://doi.org/10.1116/1.4874318
Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography
Wang, L., Kirk, E., Wäckerlin, C., Schneider, C. W., Hojeij, M., Gobrecht, J., & Ekinci, Y. (2014). Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography. Nanotechnology, 25(23), 235305 (7 pp.). https://doi.org/10.1088/0957-4484/25/23/235305
pH response of silicon nanowire sensors: impact of nanowire width and gate oxide
Bedner, K., Guzenko, V. A., Tarasov, A., Wipf, M., Stoop, R. L., Just, D., … Schönenberger, C. (2013). pH response of silicon nanowire sensors: impact of nanowire width and gate oxide. Sensors and Materials, 25(8), 567-576. https://doi.org/10.18494/SAM.2013.890