Active Filters

  • (-) PSI Authors = Kazazis, Dimitrios
Search Results 1 - 20 of 45
Select Page
Chemically-amplified backbone scission (CABS) resist for EUV lithography.
Manouras, T., Kazazis, D., & Ekinci, Y. (2021). Chemically-amplified backbone scission (CABS) resist for EUV lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 11609H (9 pp.). https://doi.org/10.1117/12.2584085
Lensless EUV mask inspection for anamorphic patterns
Mochi, I., Kim, H. S., Dejkameh, A., Nebling, R., Dimitrios, K., Locans, U., … Ekinci, Y. (2021). Lensless EUV mask inspection for anamorphic patterns. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090M (6 pp.). https://doi.org/10.1117/12.2584518
Electrically tunable filter based on plasmonic phase retarder and liquid crystals
Driencourt, L., Federspiel, F., Kazazis, D., Tseng, L. T., Frantz, R., Ekinci, Y., … Gallinet, B. (2020). Electrically tunable filter based on plasmonic phase retarder and liquid crystals. In C. J. Chang-Hasnain, A. Faraon, & W. Zhou (Eds.), Proceedings of SPIE: Vol. 11290. High contrast metastructures IX (p. 112901A (6 pp.). https://doi.org/10.1117/12.2543569
Electrically tunable multicolored filter using birefringent plasmonic resonators and liquid crystals
Driencourt, L., Federspiel, F., Kazazis, D., Tseng, L. T., Frantz, R., Ekinci, Y., … Gallinet, B. (2020). Electrically tunable multicolored filter using birefringent plasmonic resonators and liquid crystals. ACS Photonics, 7(2), 444-453. https://doi.org/10.1021/acsphotonics.9b01404
Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning
Kazazis, D., Tseng, L. T., & Ekinci, Y. (2020). Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning. Microelectronic Engineering, 225, 111273 (7 pp.). https://doi.org/10.1016/j.mee.2020.111273
High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review
Kim, H., Locans, U., Nebling, R., Dejkameh, A., Kazazis, D., Ekinci, Y., & Mochi, I. (2020). High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180X (7 pp.). SPIE.
Anisotropic etching of pyramidal silica reliefs with metal masks and hydrofluoric acid
Kirchner, R., Neumann, V., Winkler, F., Strobel, C., Völkel, S., Hiess, A., … Bartha, J. W. (2020). Anisotropic etching of pyramidal silica reliefs with metal masks and hydrofluoric acid. Small, 16(43), 2002290 (7 pp.). https://doi.org/10.1002/smll.202002290
Illumination control in lensless imaging for EUV mask inspection and review
Mochi, I., Kim, H. S., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., & Ekinici, Y. (2020). Illumination control in lensless imaging for EUV mask inspection and review. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11323. Extreme ultraviolet (EUV) lithography XI (p. 113231I (9 pp.). https://doi.org/10.1117/12.2552014
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002
Grayscale e-beam lithography: effects of a delayed development for well-controlled 3D patterning
Mortelmans, T., Kazazis, D., Guzenko, V. A., Padeste, C., Braun, T., Li, X., & Ekinci, Y. (2020). Grayscale e-beam lithography: effects of a delayed development for well-controlled 3D patterning. Microelectronic Engineering, 225, 111272 (5 pp.). https://doi.org/10.1016/j.mee.2020.111272
Laser repair and clean of extreme ultraviolet lithography photomasks
Robinson, T., LeClaire, J., Mochi, I., Nebling, R. M., Ekinci, Y., & Kazazis, D. (2020). Laser repair and clean of extreme ultraviolet lithography photomasks. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 1151809 (15 pp.). SPIE.
Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging
Fernandez, S., Kazazis, D., Rajendran, R., Mochi, I., Helfenstein, P., Yoshitake, S., & Ekinci, Y. (2019). Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013506 (6 pp.). https://doi.org/10.1117/1.JMM.18.1.013506
Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution
Gädda, T., Luong, N. D., Laukkanen, M., Karaste, K., Kähkönen, O., Kauppi, E., … Rantala, J. (2019). Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution. In R. Gronheid & D. P. Sanders (Eds.), Proceedings of SPIE: Vol. 10960. Advances in patterning materials and processes XXXVI (p. 109600B (7 pp.). https://doi.org/10.1117/12.2515600
Absorber and phase defect inspection on EUV reticles using RESCAN
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Helfenstein, P., Rajeev, R., … Ekinci, Y. (2019). Absorber and phase defect inspection on EUV reticles using RESCAN. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme Ultraviolet (EUV) lithography X (p. 109570W (8 pp.). https://doi.org/10.1117/12.2515160
Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging
Mochi, I., Timmermans, M. Y., Gallagher, E. E., Mariano, M., Pollentier, I., Rajendran, R., … Ekinci, Y. (2019). Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 014002 (7 pp.). https://doi.org/10.1117/1.JMM.18.1.014002
Lensless metrology for semiconductor lithography at EUV
Mochi, I., Kazazis, D., Tseng, L. T., Fernandez, S., Rajeev, R., Locans, U., … Ekinci, Y. (2019). Lensless metrology for semiconductor lithography at EUV. In B. Bodermann, K. Frenner, & R. M. Silver (Eds.), Proceedings of SPIE: Vol. 11057. Modeling aspects in optical metrology VII (p. 1105703 (7 pp.). https://doi.org/10.1117/12.2534350
Resolution enhancement for lensless mask metrology with RESCAN
Mochi, I., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., Tseng, L. T., & Ekinci, Y. (2019). Resolution enhancement for lensless mask metrology with RESCAN. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 111471D (8 pp.). https://doi.org/10.1117/12.2537068
EUV reticle inspection using phase retrieval algorithms: a performance comparison
Nebling, R., Mochi, I., Kazazis, D., Locans, U., Dejkameh, A., & Ekinci, Y. (2019). EUV reticle inspection using phase retrieval algorithms: a performance comparison. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 111470R (7 pp.). https://doi.org/10.1117/12.2536936
Multi-trigger resist: novel synthesis improvements for high resolution EUV lithography
O’Callaghan, G., Popescu, C., McClelland, A., Kazazis, D., Roth, J., Theis, W., … Robinson, A. P. G. (2019). Multi-trigger resist: novel synthesis improvements for high resolution EUV lithography. In R. Gronheid & D. P. Sanders (Eds.), Proceedings of SPIE: Vol. 10960. Advances in patterning materials and processes XXXVI (p. 109600C (9 pp.). https://doi.org/10.1117/12.2515084
Sub-20 nm Si fins with high aspect ratio via pattern transfer using fullerene-based spin-on-carbon hard masks
Tseng, L. T., Kazazis, D., Wang, X., Popescu, C. M., Robinson, A. P. G., & Ekinci, Y. (2019). Sub-20 nm Si fins with high aspect ratio via pattern transfer using fullerene-based spin-on-carbon hard masks. Microelectronic Engineering, 210, 8-13. https://doi.org/10.1016/j.mee.2019.03.002