Active Filters

  • (-) PSI Authors = Mochi, Iacopo
Search Results 1 - 20 of 40
Select Page
Progress in EUV resist screening towards the deployment of high-NA lithography
Allenet, T., Wang, X., Vockenhuber, M., Yeh, C. K., Mochi, I., Santaclara, J. G., … Ekinci, Y. (2021). Progress in EUV resist screening towards the deployment of high-NA lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090J (10 pp.). https://doi.org/10.1117/12.2583983
Lensless EUV mask inspection for anamorphic patterns
Mochi, I., Kim, H. S., Dejkameh, A., Nebling, R., Dimitrios, K., Locans, U., … Ekinci, Y. (2021). Lensless EUV mask inspection for anamorphic patterns. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090M (6 pp.). https://doi.org/10.1117/12.2584518
High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review
Kim, H., Locans, U., Nebling, R., Dejkameh, A., Kazazis, D., Ekinci, Y., & Mochi, I. (2020). High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180X (7 pp.). SPIE.
Illumination control in lensless imaging for EUV mask inspection and review
Mochi, I., Kim, H. S., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., & Ekinici, Y. (2020). Illumination control in lensless imaging for EUV mask inspection and review. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11323. Extreme ultraviolet (EUV) lithography XI (p. 113231I (9 pp.). https://doi.org/10.1117/12.2552014
Open-source software for SEM metrology
Mochi, I., Vockenhuber, M., Allenet, T., & Ekinci, Y. (2020). Open-source software for SEM metrology. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180G (10 pp.). SPIE.
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002
Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging
Nebling, R., Kim, H. S., Locans, U., Dejkameh, A., Ekinci, Y., & Mochi, I. (2020). Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11517. Extreme Ultraviolet Lithography 2020 (p. 115170W (6 pp.). https://doi.org/10.1117/12.2573181
Laser repair and clean of extreme ultraviolet lithography photomasks
Robinson, T., LeClaire, J., Mochi, I., Nebling, R. M., Ekinci, Y., & Kazazis, D. (2020). Laser repair and clean of extreme ultraviolet lithography photomasks. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 1151809 (15 pp.). SPIE.
Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography
Thakur, N., Bliem, R., Mochi, I., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2020). Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography. Journal of Materials Chemistry C, 8(41), 14499-14506. https://doi.org/10.1039/d0tc03597a
Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging
Fernandez, S., Kazazis, D., Rajendran, R., Mochi, I., Helfenstein, P., Yoshitake, S., & Ekinci, Y. (2019). Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013506 (6 pp.). https://doi.org/10.1117/1.JMM.18.1.013506
Absorber and phase defect inspection on EUV reticles using RESCAN
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Helfenstein, P., Rajeev, R., … Ekinci, Y. (2019). Absorber and phase defect inspection on EUV reticles using RESCAN. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme Ultraviolet (EUV) lithography X (p. 109570W (8 pp.). https://doi.org/10.1117/12.2515160
Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging
Mochi, I., Timmermans, M. Y., Gallagher, E. E., Mariano, M., Pollentier, I., Rajendran, R., … Ekinci, Y. (2019). Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 014002 (7 pp.). https://doi.org/10.1117/1.JMM.18.1.014002
Lensless EUV lithography and imaging
Mochi, I., & Ekinci, Y. (2019). Lensless EUV lithography and imaging. Synchrotron Radiation News, 32(4), 22-27. https://doi.org/10.1080/08940886.2019.1634433
Lensless metrology for semiconductor lithography at EUV
Mochi, I., Kazazis, D., Tseng, L. T., Fernandez, S., Rajeev, R., Locans, U., … Ekinci, Y. (2019). Lensless metrology for semiconductor lithography at EUV. In B. Bodermann, K. Frenner, & R. M. Silver (Eds.), Proceedings of SPIE: Vol. 11057. Modeling aspects in optical metrology VII (p. 1105703 (7 pp.). https://doi.org/10.1117/12.2534350
Resolution enhancement for lensless mask metrology with RESCAN
Mochi, I., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., Tseng, L. T., & Ekinci, Y. (2019). Resolution enhancement for lensless mask metrology with RESCAN. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 111471D (8 pp.). https://doi.org/10.1117/12.2537068
EUV reticle inspection using phase retrieval algorithms: a performance comparison
Nebling, R., Mochi, I., Kazazis, D., Locans, U., Dejkameh, A., & Ekinci, Y. (2019). EUV reticle inspection using phase retrieval algorithms: a performance comparison. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 111470R (7 pp.). https://doi.org/10.1117/12.2536936
Towards X-ray transient grating spectroscopy
Svetina, C., Mankowsky, R., Knopp, G., Koch, F., Seniutinas, G., Rösner, B., … Beaud, P. (2019). Towards X-ray transient grating spectroscopy. Optics Letters, 44(3), 574-577. https://doi.org/10.1364/OL.44.000574
Progress in EUV resists for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Custers, R., … Ekinci, Y. (2019). Progress in EUV resists for contact holes printing using EUV interference lithography. In U. F. W. Behringer & J. Finders (Eds.), Proceedings of SPIE: Vol. 1177. 35th European mask and lithography conference (EMLC 2019) (p. 111770U (8 pp.). https://doi.org/10.1117/12.2535678
Progress in EUV resists towards high-NA EUV lithography
Wang, X., Tasdemir, Z., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Meeuwissen, M., … Ekinci, Y. (2019). Progress in EUV resists towards high-NA EUV lithography. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme ultraviolet (EUV) lithography X (p. 109570A (9 pp.). https://doi.org/10.1117/12.2516260
Progress overview of EUV resists status towards high-NA EUV lithography
Wang, X., Tseng, L. T., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Custers, R., … Ekinci, Y. (2019). Progress overview of EUV resists status towards high-NA EUV lithography. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 1114711 (10 pp.). https://doi.org/10.1117/12.2536923