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Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration
Dejkameh, A., Nebling, R., Locans, U., Kim, H. S., Mochi, I., & Ekinci, Y. (2024). Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration. Ultramicroscopy, 258, 113912 (8 pp.). https://doi.org/10.1016/j.ultramic.2023.113912
Towards fast ptychography image reconstruction of EUV masks by deep neural networks
Ansuinelli, P., Béjar Haro, B., Ekinci, Y., & Mochi, I. (2023). Towards fast ptychography image reconstruction of EUV masks by deep neural networks. In T. Liang (Ed.), Proceedings of SPIE - the international society for optical rngineering: Vol. 12751. Photomask technology (p. 127510Q (10 pp.). https://doi.org/10.1117/12.2685227
Advancements in EUV photoresists for high-NA lithography
Develioglu, A., Vockenhuber, M., Van Lent-Protasova, L., Mochi, I., Ekinci, Y., & Kazazis, D. (2023). Advancements in EUV photoresists for high-NA lithography. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE - the international society for optical engineering: Vol. 12750. International conference on extreme ultraviolet lithography (p. 1275008 (11 pp.). https://doi.org/10.1117/12.2686250
The EUV lithography resist screening activities in H2-2022
Develioglu, A., Allenet, T. P., Vockenhuber, M., van Lent-Protasova, L., Mochi, I., Ekinci, Y., & Kazazis, D. (2023). The EUV lithography resist screening activities in H2-2022. In D. Guerrero & G. R. Amblard (Eds.), Proceedings of SPIE: Vol. 12498. Advances in patterning materials and processes XL (p. 1249805 (9 pp.). https://doi.org/10.1117/12.2660859
Deep learning denoiser assisted roughness measurements extraction from thin resists with low signal-To-noise ratio (SNR) SEM images: analysis with SMILE
Sacchi, S., Dey, B., Mochi, I., Halder, S., & Leray, P. (2023). Deep learning denoiser assisted roughness measurements extraction from thin resists with low signal-To-noise ratio (SNR) SEM images: analysis with SMILE. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE - the international society for optical engineering: Vol. 12750. International conference on extreme ultraviolet lithography (p. 1275010 (12 pp.). https://doi.org/10.1117/12.2687639
EUV grazing-incidence lensless imaging wafer metrology
Shen, T., Ansuinelli, P., Mochi, I., & Ekinci, Y. (2023). EUV grazing-incidence lensless imaging wafer metrology. In J. C. Robinson & M. J. Sendelbach (Eds.), Proceedings of SPIE: Vol. 12496. Metrology, inspection, and process control XXXVII (p. 124960Z (8 pp.). https://doi.org/10.1117/12.2658436
EUV reflective coherent diffraction imaging system for wafer metrology
Shen, T., Ansuinelli, P., Mochi, I., Kang, Y. W., Ahn, J., & Ekinci, Y. (2023). EUV reflective coherent diffraction imaging system for wafer metrology. In P. Lehmann (Ed.), Proceedings of SPIE: Vol. 12618. Optical measurement systems for industrial inspection XIII (p. 126180N (6 pp.). https://doi.org/10.1117/12.2673832
Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology
Kim, H. S., Nebling, R., Dejkameh, A., Shen, T., Ekinci, Y., & Mochi, I. (2022). Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology. Journal of Micro/Nanopatterning, Materials, and Metrology, 21(3), 34002 (12 PP.). https://doi.org/10.1117/1.JMM.21.3.034002
EUV mask defect material characterization through actinic lensless imaging
Shen, T., Kazazis, D., Kim, H. S., Dejkameh, A., Nebling, R., Ekinci, Y., & Mochi, I. (2022). EUV mask defect material characterization through actinic lensless imaging. In J. C. Robinson & M. J. Sendelbach (Eds.), Proceedings of SPIE: Vol. 12053. Metrology, inspection, and process control XXXVI (p. 120530H (8 pp.). https://doi.org/10.1117/12.2613337
Reflective grazing incidence EUV nanoscope for wafer metrology
Shen, T., Ekinci, Y., & Mochi, I. (2022). Reflective grazing incidence EUV nanoscope for wafer metrology. In T. Itani, P. P. Naulleau, P. A. Gargini, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 12292. International conference on extreme ultraviolet lithography 2022 (p. 122920O (7 pp.). https://doi.org/10.1117/12.2641776
Progress in EUV resist screening towards the deployment of high-NA lithography
Allenet, T., Wang, X., Vockenhuber, M., Yeh, C. K., Mochi, I., Santaclara, J. G., … Ekinci, Y. (2021). Progress in EUV resist screening towards the deployment of high-NA lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090J (10 pp.). https://doi.org/10.1117/12.2583983
Resolution limit and photon flux dependency in EUV ptychography 
Kim, H., Nebling, R., Dejkameh, A., Tao, S., Mochi, I., & Ekinci, Y. (2021). Resolution limit and photon flux dependency in EUV ptychography . In Kim, Nebling, Dejkameh, Tao, Iacopo, Yasin, & S. P. Renwick (Eds.), Proceedings of SPIE: Vol. 11855. Photomask technology 2021 (p. 1185506 (8 pp.). https://doi.org/10.1117/12.2601246
Contacts and lines SEM image metrology with SMILE
Mochi, I., Vockenhuber, M., Allenet, T., & Ekinci, Y. (2021). Contacts and lines SEM image metrology with SMILE. In S. P. Renwick (Ed.), Proceedings of SPIE: Vol. 11855. Photomask technology 2021 (p. 1185502 (8 pp.). https://doi.org/10.1117/12.2600911
Lensless EUV mask inspection for anamorphic patterns
Mochi, I., Kim, H. S., Dejkameh, A., Nebling, R., Kazazis, D., Locans, U., … Ekinci, Y. (2021). Lensless EUV mask inspection for anamorphic patterns. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090M (6 pp.). https://doi.org/10.1117/12.2584518
A priori information in ptychographic image reconstruction for EUV mask metrology
Nebling, R., Mochi, I., Kim, Hsu, Dejkameh, A., Shen, T., & Ekinci, Y. (2021). A priori information in ptychographic image reconstruction for EUV mask metrology. In R. Nebling, I. Mochi, Hsu Kim, A. Dejkameh, T. Shen, Y. Ekinci, … A. Erdmann (Eds.), Proceedings of SPIE: Vol. 11875. Computational optics 2021 (p. 118750M (8 pp.). https://doi.org/10.1117/12.2600233
Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks
Robinson, T., Leclaire, J., Mochi, I., Nebling, R. M., Ekinci, Y., & Kazazis, D. (2021). Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks. In A. Ando (Ed.), Proceedings of SPIE: Vol. 11908. Photomask Japan 2021: XXVII symposium on photomask and next-generation lithography mask technology (p. 119080O (13 pp.). https://doi.org/10.1117/12.2601395
High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review
Kim, H., Locans, U., Nebling, R., Dejkameh, A., Kazazis, D., Ekinci, Y., & Mochi, I. (2020). High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180X (7 pp.). https://doi.org/10.1117/12.2573240
Open-source software for SEM metrology
Mochi, I., Vockenhuber, M., Allenet, T., & Ekinci, Y. (2020). Open-source software for SEM metrology. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180G (10 pp.). https://doi.org/10.1117/12.2573154
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002
Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging
Nebling, R., Kim, H. S., Locans, U., Dejkameh, A., Ekinci, Y., & Mochi, I. (2020). Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11517. Extreme Ultraviolet Lithography 2020 (p. 115170W (6 pp.). https://doi.org/10.1117/12.2573181