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Electrically tunable filter based on plasmonic phase retarder and liquid crystals
Driencourt, L., Federspiel, F., Kazazis, D., Tseng, L. T., Frantz, R., Ekinci, Y., … Gallinet, B. (2020). Electrically tunable filter based on plasmonic phase retarder and liquid crystals. In C. J. Chang-Hasnain, A. Faraon, & W. Zhou (Eds.), Proceedings of SPIE: Vol. 11290. High contrast metastructures IX (p. 112901A (6 pp.). https://doi.org/10.1117/12.2543569
Electrically tunable multicolored filter using birefringent plasmonic resonators and liquid crystals
Driencourt, L., Federspiel, F., Kazazis, D., Tseng, L. T., Frantz, R., Ekinci, Y., … Gallinet, B. (2020). Electrically tunable multicolored filter using birefringent plasmonic resonators and liquid crystals. ACS Photonics, 7(2), 444-453. https://doi.org/10.1021/acsphotonics.9b01404
Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning
Kazazis, D., Tseng, L. T., & Ekinci, Y. (2020). Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning. Microelectronic Engineering, 225, 111273 (7 pp.). https://doi.org/10.1016/j.mee.2020.111273
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002
Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics
Romano, L., Kagias, M., Vila-Comamala, J., Jefimovs, K., Tseng, L. T., Guzenko, V. A., & Stampanoni, M. (2020). Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics. Nanoscale Horizons, 5(5), 869-879. https://doi.org/10.1039/C9NH00709A
Absorber and phase defect inspection on EUV reticles using RESCAN
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Helfenstein, P., Rajeev, R., … Ekinci, Y. (2019). Absorber and phase defect inspection on EUV reticles using RESCAN. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme Ultraviolet (EUV) lithography X (p. 109570W (8 pp.). https://doi.org/10.1117/12.2515160
Lensless metrology for semiconductor lithography at EUV
Mochi, I., Kazazis, D., Tseng, L. T., Fernandez, S., Rajeev, R., Locans, U., … Ekinci, Y. (2019). Lensless metrology for semiconductor lithography at EUV. In B. Bodermann, K. Frenner, & R. M. Silver (Eds.), Proceedings of SPIE: Vol. 11057. Modeling aspects in optical metrology VII (p. 1105703 (7 pp.). https://doi.org/10.1117/12.2534350
Resolution enhancement for lensless mask metrology with RESCAN
Mochi, I., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., Tseng, L. T., & Ekinci, Y. (2019). Resolution enhancement for lensless mask metrology with RESCAN. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 111471D (8 pp.). https://doi.org/10.1117/12.2537068
Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters
Thakur, N., Tseng, L. T., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2019). Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters. Journal of Microlithography, Microfabrication, and Microsystems, 18(4), 043504 (10 pp.). https://doi.org/10.1117/1.JMM.18.4.043504
Sub-20 nm Si fins with high aspect ratio via pattern transfer using fullerene-based spin-on-carbon hard masks
Tseng, L. T., Kazazis, D., Wang, X., Popescu, C. M., Robinson, A. P. G., & Ekinci, Y. (2019). Sub-20 nm Si fins with high aspect ratio via pattern transfer using fullerene-based spin-on-carbon hard masks. Microelectronic Engineering, 210, 8-13. https://doi.org/10.1016/j.mee.2019.03.002
Progress in EUV resists for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Custers, R., … Ekinci, Y. (2019). Progress in EUV resists for contact holes printing using EUV interference lithography. In U. F. W. Behringer & J. Finders (Eds.), Proceedings of SPIE: Vol. 1177. 35th European mask and lithography conference (EMLC 2019) (p. 111770U (8 pp.). https://doi.org/10.1117/12.2535678
Progress overview of EUV resists status towards high-NA EUV lithography
Wang, X., Tseng, L. T., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Custers, R., … Ekinci, Y. (2019). Progress overview of EUV resists status towards high-NA EUV lithography. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 1114711 (10 pp.). https://doi.org/10.1117/12.2536923
Studying resist performance for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Kazazis, D., Tasdemir, Z., Vockenhuber, M., Mochi, I., & Ekinci, Y. (2019). Studying resist performance for contact holes printing using EUV interference lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013501 (11 pp.). https://doi.org/10.1117/1.JMM.18.1.013501
Improving the resolution and throughput of achromatic Talbot lithography
Kazazis, D., Tseng, L. T., & Ekinci, Y. (2018). Improving the resolution and throughput of achromatic Talbot lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 36(6), 06J501 (11 pp.). https://doi.org/10.1116/1.5048506
Phase defect inspection on EUV masks using RESCAN
Rajeev, R., Mochi, I., Kazazis, D., Fernandez, S., Li-Teng, T., Helfenstein, P., & Ekinci, Y. (2018). Phase defect inspection on EUV masks using RESCAN. In K. G. Ronse, E. Hendrickx, P. P. Naulleau, P. A. Gargini, & T. Itani (Eds.), Proceedings of SPIE: Vol. 10809. International conference on extreme ultraviolet lithography 2018 (p. 108090Q (10 pp.). https://doi.org/10.1117/12.2502726
Studying resist performance for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Kazazis, D., Tasdemir, Z., Vockenhuber, M., Mochi, I., & Ekinci, Y. (2018). Studying resist performance for contact holes printing using EUV interference lithography. In K. G. Ronse, E. Hendrickx, P. P. Naulleau, P. A. Gargini, & T. Itani (Eds.), Proceedings of SPIE: Vol. 10809. International conference on extreme ultraviolet lithography 2018 (p. 108091Z (13 pp.). https://doi.org/10.1117/12.2501949
Intrinsic and spatially nonuniform ferromagnetism in Co-doped ZnO films
Tseng, L. T., Suter, A., Wang, Y. R., Xiang, F. X., Bian, P., Ding, X., … Yi, J. B. (2017). Intrinsic and spatially nonuniform ferromagnetism in Co-doped ZnO films. Physical Review B, 96(10), 104423 (10 pp.). https://doi.org/10.1103/PhysRevB.96.104423