Active Filters

  • (-) PSI Authors = Tseng, Li-Ting
  • (-) Keywords = EUV mask review
Search Results 1 - 1 of 1
  • RSS Feed
Select Page
Resolution enhancement for lensless mask metrology with RESCAN
Mochi, I., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., Tseng, L. T., & Ekinci, Y. (2019). Resolution enhancement for lensless mask metrology with RESCAN. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 111471D (8 pp.). https://doi.org/10.1117/12.2537068