Active Filters

  • (-) PSI Authors = Vockenhuber, Michaela
Search Results 1 - 20 of 45
Select Page
Progress in EUV resist screening towards the deployment of high-NA lithography
Allenet, T., Wang, X., Vockenhuber, M., Yeh, C. K., Mochi, I., Santaclara, J. G., … Ekinci, Y. (2021). Progress in EUV resist screening towards the deployment of high-NA lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090J (10 pp.). https://doi.org/10.1117/12.2583983
Open-source software for SEM metrology
Mochi, I., Vockenhuber, M., Allenet, T., & Ekinci, Y. (2020). Open-source software for SEM metrology. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180G (10 pp.). SPIE.
Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography
Thakur, N., Bliem, R., Mochi, I., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2020). Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography. Journal of Materials Chemistry C, 8(41), 14499-14506. https://doi.org/10.1039/d0tc03597a
Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy
Wu, L., Bespalov, I., Witte, K., Lugier, O., Haitjema, J., Vockenhuber, M., … Castellanos, S. (2020). Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy. Journal of Materials Chemistry C, 8(42), 14757-14765. https://doi.org/10.1039/d0tc03216f
Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters
Thakur, N., Tseng, L. T., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2019). Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters. Journal of Microlithography, Microfabrication, and Microsystems, 18(4), 043504 (10 pp.). https://doi.org/10.1117/1.JMM.18.4.043504
Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
Thakur, N., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2019). Zinc-based metal oxoclusters: towards enhanced EUV absorptivity. In G. Kenneth A. (Ed.), Proceedings of SPIE: Vol. 10957. Extreme ultraviolet (EUV) lithography X (p. 109570D (11 pp.). https://doi.org/10.1117/12.2514814
Progress in EUV resists for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Custers, R., … Ekinci, Y. (2019). Progress in EUV resists for contact holes printing using EUV interference lithography. In U. F. W. Behringer & J. Finders (Eds.), Proceedings of SPIE: Vol. 1177. 35th European mask and lithography conference (EMLC 2019) (p. 111770U (8 pp.). https://doi.org/10.1117/12.2535678
Progress in EUV resists towards high-NA EUV lithography
Wang, X., Tasdemir, Z., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Meeuwissen, M., … Ekinci, Y. (2019). Progress in EUV resists towards high-NA EUV lithography. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme ultraviolet (EUV) lithography X (p. 109570A (9 pp.). https://doi.org/10.1117/12.2516260
Progress overview of EUV resists status towards high-NA EUV lithography
Wang, X., Tseng, L. T., Mochi, I., Vockenhuber, M., van Lent-Protasova, L., Custers, R., … Ekinci, Y. (2019). Progress overview of EUV resists status towards high-NA EUV lithography. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 1114711 (10 pp.). https://doi.org/10.1117/12.2536923
Studying resist performance for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Kazazis, D., Tasdemir, Z., Vockenhuber, M., Mochi, I., & Ekinci, Y. (2019). Studying resist performance for contact holes printing using EUV interference lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013501 (11 pp.). https://doi.org/10.1117/1.JMM.18.1.013501
Hybrid EUV resists with mixed organic shells: a simple preparation method
Wu, L., Liu, J., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2019). Hybrid EUV resists with mixed organic shells: a simple preparation method. European Journal of Inorganic Chemistry, 2019(38), 4136-4141. https://doi.org/10.1002/ejic.201900745
Mechanistic insights in Zr- and Hf-based molecular hybrid EUV photoresists
Wu, L., Baljozovic, M., Portale, G., Kazazis, D., Vockenhuber, M., Jung, T., … Castellanos, S. (2019). Mechanistic insights in Zr- and Hf-based molecular hybrid EUV photoresists. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013504 (10 pp.). https://doi.org/10.1117/1.JMM.18.1.013504
The role of the organic shell in hybrid molecular materials for EUV lithography
Wu, L., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2019). The role of the organic shell in hybrid molecular materials for EUV lithography. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme ultraviolet (EUV) lithography X (p. 109570B (7 pp.). https://doi.org/10.1117/12.2515264
Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
Castellanos, S., Wu, L., Baljozovic, M., Portale, G., Kazazis, D., Vockenhuber, M., … Jung, T. (2018). Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10583. Extreme ultraviolet (EUV) lithography IX (p. 105830A (12 pp.). https://doi.org/10.1117/12.2297167
Chemically-amplified EUV resists approaching 11nm half-pitch
Tasdemir, Z., Vockenhuber, M., Mochi, I., Garrido Olvera, K., Meeuwissen, M., Yildirim, O., … Ekinci, Y. (2018). Chemically-amplified EUV resists approaching 11nm half-pitch. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10583. Extreme ultraviolet (EUV) lithography IX (p. 105831W (7 pp.). https://doi.org/10.1117/12.2299643
Studying resist performance for contact holes printing using EUV interference lithography
Wang, X., Tseng, L. T., Kazazis, D., Tasdemir, Z., Vockenhuber, M., Mochi, I., & Ekinci, Y. (2018). Studying resist performance for contact holes printing using EUV interference lithography. In K. G. Ronse, E. Hendrickx, P. P. Naulleau, P. A. Gargini, & T. Itani (Eds.), Proceedings of SPIE: Vol. 10809. International conference on extreme ultraviolet lithography 2018 (p. 108091Z (13 pp.). https://doi.org/10.1117/12.2501949
First-row transitional-metal oxalate resists for EUV
Wilklow-Marnell, M., Moglia, D., Steimle, B., Cardineau, B., Al-Mashat, H., Nastasi, P., … Freedman, D. A. (2018). First-row transitional-metal oxalate resists for EUV. Journal of Micro/Nanolithography, MEMS, and MOEMS, 17(4), 043507 (9 pp.). https://doi.org/10.1117/1.JMM.17.4.043507
Dual-tone application of a tin-oxo cage photoresist under e-beam and EUV exposure
Zhang, Y., Haitjema, J., Baljozovic, M., Vockenhuber, M., Kazazis, D., Jung, T. A., … Brouwer, A. M. (2018). Dual-tone application of a tin-oxo cage photoresist under e-beam and EUV exposure. Journal of Photopolymer Science and Technology, 31(2), 249-255. https://doi.org/10.2494/photopolymer.31.249
State-of-the-art EUV materials and processes for the 7 nm node and beyond
Buitrago, E., Meeuwissen, M., Yildirim, O., Custers, R., Hoefnagels, R., Rispens, G., … Ekinci, Y. (2017). State-of-the-art EUV materials and processes for the 7 nm node and beyond. In E. M. Panning & K. A. Goldberg (Eds.), Proceedings of SPIE: Vol. 10143. Extreme Ultraviolet (EUV) lithography VIII (p. 101430T (8 pp.). https://doi.org/10.1117/12.2260153
Extreme ultraviolet patterning of tin-oxo cages
Haitjema, J., Zhang, Y., Vockenhuber, M., Kazazis, D., Ekinci, Y., & Brouwer, A. M. (2017). Extreme ultraviolet patterning of tin-oxo cages. In E. M. Panning & K. A. Goldberg (Eds.), Proceedings of SPIE: Vol. 10143. Extreme Ultraviolet (EUV) lithography VIII (p. 1014325 (10 pp.). https://doi.org/10.1117/12.2257911