| Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration
Dejkameh, A., Nebling, R., Locans, U., Kim, H. S., Mochi, I., & Ekinci, Y. (2024). Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration. Ultramicroscopy, 258, 113912 (8 pp.). https://doi.org/10.1016/j.ultramic.2023.113912 |
| Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology
Kim, H. S., Nebling, R., Dejkameh, A., Shen, T., Ekinci, Y., & Mochi, I. (2022). Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology. Journal of Micro/Nanopatterning, Materials, and Metrology, 21(3), 34002 (12 PP.). https://doi.org/10.1117/1.JMM.21.3.034002 |
| EUV mask defect material characterization through actinic lensless imaging
Shen, T., Kazazis, D., Kim, H. S., Dejkameh, A., Nebling, R., Ekinci, Y., & Mochi, I. (2022). EUV mask defect material characterization through actinic lensless imaging. In J. C. Robinson & M. J. Sendelbach (Eds.), Proceedings of SPIE: Vol. 12053. Metrology, inspection, and process control XXXVI (p. 120530H (8 pp.). https://doi.org/10.1117/12.2613337 |
| Resolution limit and photon flux dependency in EUV ptychography
Kim, H., Nebling, R., Dejkameh, A., Tao, S., Mochi, I., & Ekinci, Y. (2021). Resolution limit and photon flux dependency in EUV ptychography . In Kim, Nebling, Dejkameh, Tao, Iacopo, Yasin, & S. P. Renwick (Eds.), Proceedings of SPIE: Vol. 11855. Photomask technology 2021 (p. 1185506 (8 pp.). https://doi.org/10.1117/12.2601246 |
| Lensless EUV mask inspection for anamorphic patterns
Mochi, I., Kim, H. S., Dejkameh, A., Nebling, R., Kazazis, D., Locans, U., … Ekinci, Y. (2021). Lensless EUV mask inspection for anamorphic patterns. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090M (6 pp.). https://doi.org/10.1117/12.2584518 |
| A priori information in ptychographic image reconstruction for EUV mask metrology
Nebling, R., Mochi, I., Kim, Hsu, Dejkameh, A., Shen, T., & Ekinci, Y. (2021). A priori information in ptychographic image reconstruction for EUV mask metrology. In R. Nebling, I. Mochi, Hsu Kim, A. Dejkameh, T. Shen, Y. Ekinci, … A. Erdmann (Eds.), Proceedings of SPIE: Vol. 11875. Computational optics 2021 (p. 118750M (8 pp.). https://doi.org/10.1117/12.2600233 |
| Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks
Robinson, T., Leclaire, J., Mochi, I., Nebling, R. M., Ekinci, Y., & Kazazis, D. (2021). Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks. In A. Ando (Ed.), Proceedings of SPIE: Vol. 11908. Photomask Japan 2021: XXVII symposium on photomask and next-generation lithography mask technology (p. 119080O (13 pp.). https://doi.org/10.1117/12.2601395 |
| High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review
Kim, H., Locans, U., Nebling, R., Dejkameh, A., Kazazis, D., Ekinci, Y., & Mochi, I. (2020). High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180X (7 pp.). https://doi.org/10.1117/12.2573240 |
| Illumination control in lensless imaging for EUV mask inspection and review
Mochi, I., Kim, H. S., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., & Ekinici, Y. (2020). Illumination control in lensless imaging for EUV mask inspection and review. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11323. Extreme ultraviolet (EUV) lithography XI (p. 113231I (9 pp.). https://doi.org/10.1117/12.2552014 |
| Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002 |
| Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging
Nebling, R., Kim, H. S., Locans, U., Dejkameh, A., Ekinci, Y., & Mochi, I. (2020). Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11517. Extreme Ultraviolet Lithography 2020 (p. 115170W (6 pp.). https://doi.org/10.1117/12.2573181 |
| Laser repair and clean of extreme ultraviolet lithography photomasks
Robinson, T., LeClaire, J., Mochi, I., Nebling, R. M., Ekinci, Y., & Kazazis, D. (2020). Laser repair and clean of extreme ultraviolet lithography photomasks. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 1151809 (15 pp.). https://doi.org/10.1117/12.2573084 |
| Absorber and phase defect inspection on EUV reticles using RESCAN
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Helfenstein, P., Rajeev, R., … Ekinci, Y. (2019). Absorber and phase defect inspection on EUV reticles using RESCAN. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme Ultraviolet (EUV) lithography X (p. 109570W (8 pp.). https://doi.org/10.1117/12.2515160 |
| Lensless metrology for semiconductor lithography at EUV
Mochi, I., Kazazis, D., Tseng, L. T., Fernandez, S., Rajeev, R., Locans, U., … Ekinci, Y. (2019). Lensless metrology for semiconductor lithography at EUV. In B. Bodermann, K. Frenner, & R. M. Silver (Eds.), Proceedings of SPIE: Vol. 11057. Modeling aspects in optical metrology VII (p. 1105703 (7 pp.). https://doi.org/10.1117/12.2534350 |
| Resolution enhancement for lensless mask metrology with RESCAN
Mochi, I., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., Tseng, L. T., & Ekinci, Y. (2019). Resolution enhancement for lensless mask metrology with RESCAN. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 111471D (8 pp.). https://doi.org/10.1117/12.2537068 |
| EUV reticle inspection using phase retrieval algorithms: a performance comparison
Nebling, R., Mochi, I., Kazazis, D., Locans, U., Dejkameh, A., & Ekinci, Y. (2019). EUV reticle inspection using phase retrieval algorithms: a performance comparison. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 111470R (7 pp.). https://doi.org/10.1117/12.2536936 |
