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  • (-) PSI Authors = Fallica, Roberto A.
  • (-) Keywords = extreme ultraviolet
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Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
Fallica, R., Haitjema, J., Wu, L., Castellanos, S., Brouwer, A. M., & Ekinci, Y. (2018). Absorption coefficient of metal-containing photoresists in the extreme ultraviolet. Journal of Micro/Nanolithography, MEMS, and MOEMS, 17(2), 023505 (7 pp.). https://doi.org/10.1117/1.JMM.17.2.023505
High-resolution grayscale patterning using extreme ultraviolet interference lithography
Fallica, R., Kirchner, R., Schift, H., & Ekinci, Y. (2017). High-resolution grayscale patterning using extreme ultraviolet interference lithography. Microelectronic Engineering, 177, 1-5. https://doi.org/10.1016/j.mee.2017.01.007
Organometallic carboxylate resists for extreme ultraviolet with high sensitivity
Passarelli, J., Murphy, M., Del Re, R., Sortland, M., Hotalen, J., Dousharm, L., … Brainard, R. L. (2015). Organometallic carboxylate resists for extreme ultraviolet with high sensitivity. Journal of Micro/Nanolithography, MEMS, and MOEMS, 14(4), 043503 (10 pp.). https://doi.org/10.1117/1.JMM.14.4.043503