| Effects of temporal coherence on EUV lensless imaging
Fernandez, S., Rajeev, R., Helfenstein, P., Kazazis, D., Ekinci, Y., & Mochi, I. (2024). Effects of temporal coherence on EUV lensless imaging. In M. J. Sendelbach & N. G. Schuch (Eds.), Proceedings of SPIE - The international society for optical engineering: Vol. 12955. Metrology, inspection, and process control (p. 129552Y). https://doi.org/10.1117/12.3010514 |
| Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002 |
| Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging
Fernandez, S., Kazazis, D., Rajendran, R., Mochi, I., Helfenstein, P., Yoshitake, S., & Ekinci, Y. (2019). Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013506 (6 pp.). https://doi.org/10.1117/1.JMM.18.1.013506 |
| Absorber and phase defect inspection on EUV reticles using RESCAN
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Helfenstein, P., Rajeev, R., … Ekinci, Y. (2019). Absorber and phase defect inspection on EUV reticles using RESCAN. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme Ultraviolet (EUV) lithography X (p. 109570W (8 pp.). https://doi.org/10.1117/12.2515160 |
| Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging
Mochi, I., Timmermans, M. Y., Gallagher, E. E., Mariano, M., Pollentier, I., Rajendran, R., … Ekinci, Y. (2019). Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 014002 (7 pp.). https://doi.org/10.1117/1.JMM.18.1.014002 |
| Lensless metrology for semiconductor lithography at EUV
Mochi, I., Kazazis, D., Tseng, L. T., Fernandez, S., Rajeev, R., Locans, U., … Ekinci, Y. (2019). Lensless metrology for semiconductor lithography at EUV. In B. Bodermann, K. Frenner, & R. M. Silver (Eds.), Proceedings of SPIE: Vol. 11057. Modeling aspects in optical metrology VII (p. 1105703 (7 pp.). https://doi.org/10.1117/12.2534350 |
| A comparative study of EUV absorber materials using lensless actinic imaging of EUV photomasks
Fernandez, S., Kazazis, D., Rajeev, R., Mochi, I., Helfenstein, P., Yoshitake, S., & Ekinci, Y. (2018). A comparative study of EUV absorber materials using lensless actinic imaging of EUV photomasks. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10583. Extreme ultraviolet (EUV) lithography IX (p. 105831H (8 pp.). https://doi.org/10.1117/12.2297381 |
| Experimental evaluation of the impact of EUV pellicles on reticle imaging
Mochi, I., Timmermans, M., Gallagher, E., Mariano, M., Pollentier, I., Rajeev, R., … Ekinci, Y. (2018). Experimental evaluation of the impact of EUV pellicles on reticle imaging. In E. E. Gallagher & J. H. Rankin (Eds.), Proceedings of SPIE: Vol. 10810. Photomask technology 2018 (p. 108100Y (9 pp.). https://doi.org/10.1117/12.2502480 |
| Through-pellicle inspection of EUV masks
Mochi, I., Rajeev, R., Helfenstein, P., Fernandez, S., Kazazis, D., & Ekinci, Y. (2018). Through-pellicle inspection of EUV masks. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10583. Extreme ultraviolet (EUV) lithography IX (p. 105831I (7 pp.). https://doi.org/10.1117/12.2297436 |
| Phase defect inspection on EUV masks using RESCAN
Rajeev, R., Mochi, I., Kazazis, D., Fernandez, S., Li-Teng, T., Helfenstein, P., & Ekinci, Y. (2018). Phase defect inspection on EUV masks using RESCAN. In K. G. Ronse, E. Hendrickx, P. P. Naulleau, P. A. Gargini, & T. Itani (Eds.), Proceedings of SPIE: Vol. 10809. International conference on extreme ultraviolet lithography 2018 (p. 108090Q (10 pp.). https://doi.org/10.1117/12.2502726 |
| Coherent diffractive imaging methods for semiconductor manufacturing
Helfenstein, P., Mochi, I., Rajeev, R., Fernandez, S., & Ekinci, Y. (2017). Coherent diffractive imaging methods for semiconductor manufacturing. Advanced Optical Technologies, 6(6), 439-448. https://doi.org/10.1515/aot-2017-0052 |
| Actinic inspection of EUV reticles with arbitrary pattern design
Mochi, I., Helfenstein, P., Rajeev, R., Fernandez, S., Kazazis, D., Yoshitake, S., & Ekinci, Y. (2017). Actinic inspection of EUV reticles with arbitrary pattern design. In P. A. Gargini, P. P. Naulleau, K. G. Ronse, & T. Itani (Eds.), Proceedings of SPIE: Vol. 10450. International conference on Extreme Ultraviolet lithography 2017 (p. 1045007 (10 pp.). https://doi.org/10.1117/12.2280528 |
