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Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration
Dejkameh, A., Nebling, R., Locans, U., Kim, H. S., Mochi, I., & Ekinci, Y. (2024). Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration. Ultramicroscopy, 258, 113912 (8 pp.). https://doi.org/10.1016/j.ultramic.2023.113912
Lensless EUV mask inspection for anamorphic patterns
Mochi, I., Kim, H. S., Dejkameh, A., Nebling, R., Kazazis, D., Locans, U., … Ekinci, Y. (2021). Lensless EUV mask inspection for anamorphic patterns. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090M (6 pp.). https://doi.org/10.1117/12.2584518
On architecture and performance of adaptive mesh refinement in an electrostatics Particle-In-Cell code
Frey, M., Adelmann, A., & Locans, U. (2020). On architecture and performance of adaptive mesh refinement in an electrostatics Particle-In-Cell code. Computer Physics Communications, 247, 106912 (18 pp.). https://doi.org/10.1016/j.cpc.2019.106912
High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review
Kim, H., Locans, U., Nebling, R., Dejkameh, A., Kazazis, D., Ekinci, Y., & Mochi, I. (2020). High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180X (7 pp.). https://doi.org/10.1117/12.2573240
Illumination control in lensless imaging for EUV mask inspection and review
Mochi, I., Kim, H. S., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., & Ekinici, Y. (2020). Illumination control in lensless imaging for EUV mask inspection and review. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11323. Extreme ultraviolet (EUV) lithography XI (p. 113231I (9 pp.). https://doi.org/10.1117/12.2552014
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002
Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging
Nebling, R., Kim, H. S., Locans, U., Dejkameh, A., Ekinci, Y., & Mochi, I. (2020). Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11517. Extreme Ultraviolet Lithography 2020 (p. 115170W (6 pp.). https://doi.org/10.1117/12.2573181
Absorber and phase defect inspection on EUV reticles using RESCAN
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Helfenstein, P., Rajeev, R., … Ekinci, Y. (2019). Absorber and phase defect inspection on EUV reticles using RESCAN. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme Ultraviolet (EUV) lithography X (p. 109570W (8 pp.). https://doi.org/10.1117/12.2515160
Lensless metrology for semiconductor lithography at EUV
Mochi, I., Kazazis, D., Tseng, L. T., Fernandez, S., Rajeev, R., Locans, U., … Ekinci, Y. (2019). Lensless metrology for semiconductor lithography at EUV. In B. Bodermann, K. Frenner, & R. M. Silver (Eds.), Proceedings of SPIE: Vol. 11057. Modeling aspects in optical metrology VII (p. 1105703 (7 pp.). https://doi.org/10.1117/12.2534350
Resolution enhancement for lensless mask metrology with RESCAN
Mochi, I., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., Tseng, L. T., & Ekinci, Y. (2019). Resolution enhancement for lensless mask metrology with RESCAN. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 111471D (8 pp.). https://doi.org/10.1117/12.2537068
EUV reticle inspection using phase retrieval algorithms: a performance comparison
Nebling, R., Mochi, I., Kazazis, D., Locans, U., Dejkameh, A., & Ekinci, Y. (2019). EUV reticle inspection using phase retrieval algorithms: a performance comparison. In T. Itani, P. A. Gargini, P. P. Naulleau, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11147. International conference on extreme ultraviolet lithography 2019 (p. 111470R (7 pp.). https://doi.org/10.1117/12.2536936
Calculation of longitudinal collective instabilities with <em>mbtrack-cuda</em>
Xu, H., Locans, U., Adelmann, A., & Stingelin, L. (2019). Calculation of longitudinal collective instabilities with mbtrack-cuda. Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 922, 345-351. https://doi.org/10.1016/j.nima.2019.01.041
MUSRFIT – real time parameter fitting using GPUs
Locans, U., & Suter, A. (2018). MUSRFIT – real time parameter fitting using GPUs. In A. Koda (Ed.), JPS conference proceedings: Vol. 21. Proceedings of the 14th international conference on muon spin rotation, relaxation and resonance (μSR2017) (p. 011051 (6 pp.). https://doi.org/10.7566/JPSCP.21.011051
A GPU variant of mbtrack and its application in SLS-2
Locans, U., Xu, H. S., Adelmann, A., & Stingelin, L. (2017). A GPU variant of mbtrack and its application in SLS-2. In V. R. W. Schaa, G. Arduini, M. Seidel, J. Pranke, & M. Lindroos (Eds.), Proceedings of the 8th international particle accelerator conference (pp. 3827-3829). https://doi.org/10.18429/JACoW-IPAC2017-THPAB051
Real-time computation of parameter fitting and image reconstruction using graphical processing units
Locans, U., Adelmann, A., Suter, A., Fischer, J., Lustermann, W., Dissertori, G., & Wang, Q. (2017). Real-time computation of parameter fitting and image reconstruction using graphical processing units. Computer Physics Communications, 215, 71-80. https://doi.org/10.1016/j.cpc.2017.02.007
The Dynamic Kernel Scheduler—part 1
Adelmann, A., Locans, U., & Suter, A. (2016). The Dynamic Kernel Scheduler—part 1. Computer Physics Communications, 207, 83-90. https://doi.org/10.1016/j.cpc.2016.05.013
Breakdown localization studies on the SwissFEL C-band test structures
Klavins, J., Dementjevs, S., Locans, U., Stingelin, L., Wohlmuther, M., Zennaro, R., … Le Pimpec, F. (2013). Breakdown localization studies on the SwissFEL C-band test structures. In Z. Dai, C. Petit-Jean-Genaz, V. R. W. Schaa, & C. Zhang (Eds.), IPAC13. The 4th international particle accelerator conference (pp. 2824-2826). JACoW Publishing.