Active Filters

  • (-) PSI Authors = Ekinci, Yasin
  • (-) Beamlines ≠ PolLux
Search Results 1 - 20 of 242

Pages

  • RSS Feed
Select Page
EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning
Constantinou, P., Stock, T. J. Z., Tseng, L. T., Kazazis, D., Muntwiler, M., Vaz, C. A. F., … Schofield, S. R. (2024). EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning. Nature Communications, 15(1), 694 (13 pp.). https://doi.org/10.1038/s41467-024-44790-6
Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration
Dejkameh, A., Nebling, R., Locans, U., Kim, H. S., Mochi, I., & Ekinci, Y. (2024). Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration. Ultramicroscopy, 258, 113912 (8 pp.). https://doi.org/10.1016/j.ultramic.2023.113912
Towards fast ptychography image reconstruction of EUV masks by deep neural networks
Ansuinelli, P., Béjar Haro, B., Ekinci, Y., & Mochi, I. (2023). Towards fast ptychography image reconstruction of EUV masks by deep neural networks. In T. Liang (Ed.), Proceedings of SPIE - the international society for optical rngineering: Vol. 12751. Photomask technology (p. 127510Q (10 pp.). https://doi.org/10.1117/12.2685227
The extent of platinum-induced hydrogen spillover on cerium dioxide
Beck, A., Kazazis, D., Ekinci, Y., Li, X., Müller Gubler, E. A., Kleibert, A., … van Bokhoven, J. A. (2023). The extent of platinum-induced hydrogen spillover on cerium dioxide. ACS Nano, 17(2), 1091-1099. https://doi.org/10.1021/acsnano.2c08152
Advancements in EUV photoresists for high-NA lithography
Develioglu, A., Vockenhuber, M., Van Lent-Protasova, L., Mochi, I., Ekinci, Y., & Kazazis, D. (2023). Advancements in EUV photoresists for high-NA lithography. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE - the international society for optical engineering: Vol. 12750. International conference on extreme ultraviolet lithography (p. 1275008 (11 pp.). https://doi.org/10.1117/12.2686250
The EUV lithography resist screening activities in H2-2022
Develioglu, A., Allenet, T. P., Vockenhuber, M., van Lent-Protasova, L., Mochi, I., Ekinci, Y., & Kazazis, D. (2023). The EUV lithography resist screening activities in H2-2022. In D. Guerrero & G. R. Amblard (Eds.), Proceedings of SPIE: Vol. 12498. Advances in patterning materials and processes XL (p. 1249805 (9 pp.). https://doi.org/10.1117/12.2660859
Influence of the anion in tin-based EUV photoresists properties
Evrard, Q., Sadegh, N., Hsu, C. C., Mahne, N., Giglia, A., Nannarone, S., … Brouwer, A. M. (2023). Influence of the anion in tin-based EUV photoresists properties. In D. Guerrero & G. R. Amblard (Eds.), Proceedings of SPIE: Vol. 12498. Advances in patterning materials and processes XL (p. 124980Z (6 pp.). https://doi.org/10.1117/12.2658498
Understanding and control of polymer distribution in photoresists using liquid chromatography for enhanced lithography performance
Im, K., Lee, C. H., Kim, M., Giannopoulos, I., Kazazis, D., Ekinci, Y., & Kwak, Y. (2023). Understanding and control of polymer distribution in photoresists using liquid chromatography for enhanced lithography performance. ACS Applied Polymer Materials, 5(12), 10091-10096. https://doi.org/10.1021/acsapm.3c01953
Enhancing the sensitivity of a high resolution negative-tone metal organic photoresist for extreme ultra violet lithography
Lewis, S. M., Alty, H. R., Vockenhuber, M., DeRose, G. A., Kazazis, D., Timco, G. A., … Winpenny, R. (2023). Enhancing the sensitivity of a high resolution negative-tone metal organic photoresist for extreme ultra violet lithography. In D. Guerrero & G. R. Amblard (Eds.), Proceedings of SPIE: Vol. 12498. Advances in patterning materials and processes XL (p. 124980X (8 pp.). https://doi.org/10.1117/12.2658324
EUV grazing-incidence lensless imaging wafer metrology
Shen, T., Ansuinelli, P., Mochi, I., & Ekinci, Y. (2023). EUV grazing-incidence lensless imaging wafer metrology. In J. C. Robinson & M. J. Sendelbach (Eds.), Proceedings of SPIE: Vol. 12496. Metrology, inspection, and process control XXXVII (p. 124960Z (8 pp.). https://doi.org/10.1117/12.2658436
EUV reflective coherent diffraction imaging system for wafer metrology
Shen, T., Ansuinelli, P., Mochi, I., Kang, Y. W., Ahn, J., & Ekinci, Y. (2023). EUV reflective coherent diffraction imaging system for wafer metrology. In P. Lehmann (Ed.), Proceedings of SPIE: Vol. 12618. Optical measurement systems for industrial inspection XIII (p. 126180N (6 pp.). https://doi.org/10.1117/12.2673832
Charge shielding-oriented design of zinc-based nanoparticle liquids for controlled nanofabrication
Tao, P., Wang, Q., Vockenhuber, M., Zhu, D., Liu, T., Wang, X., … He, X. (2023). Charge shielding-oriented design of zinc-based nanoparticle liquids for controlled nanofabrication. Journal of the American Chemical Society, 145(43), 23609-23619. https://doi.org/10.1021/jacs.3c07595
Resistless EUV lithography: photon-induced oxide patterning on silicon
Tseng, L. T., Karadan, P., Kazazis, D., Constantinou, P. C., Stock, T. J. Z., Curson, N. J., … Ekinci, Y. (2023). Resistless EUV lithography: photon-induced oxide patterning on silicon. Science Advances, 9(16), eadf5997 (10 pp.). https://doi.org/10.1126/sciadv.adf5997
Nonchemically amplified molecular resists based on sulfonium-functionalized sulfone derivatives for sub-13 nm nanolithography
Wang, Y., Chen, J., Zeng, Y., Yu, T., Wang, S., Guo, X., … Li, Y. (2023). Nonchemically amplified molecular resists based on sulfonium-functionalized sulfone derivatives for sub-13 nm nanolithography. ACS Applied Nano Materials, 6(19), 18480-18490. https://doi.org/10.1021/acsanm.3c03900
Sulfonium-functionalized polystyrene-based nonchemically amplified resists enabling sub-13 nm nanolithography
Wang, Z., Chen, J., Yu, T., Zeng, Y., Guo, X., Wang, S., … Li, Y. (2023). Sulfonium-functionalized polystyrene-based nonchemically amplified resists enabling sub-13 nm nanolithography. ACS Applied Materials and Interfaces, 15(1), 2289-2300. https://doi.org/10.1021/acsami.2c19940
Suppressing of secondary electron diffusion for high-precision nanofabrication
Wang, Q., Zhou, Y., Wang, X., Gao, H., Shu, Z., Hu, Z., … He, X. (2023). Suppressing of secondary electron diffusion for high-precision nanofabrication. Materials Today, 67, 95-105. https://doi.org/10.1016/j.mattod.2023.06.005
Theoretical insights into the solubility polarity switch of metal–organic nanoclusters for nanoscale patterning
Wang, Q., Vockenhuber, M., Cui, H., Wang, X., Tao, P., Hu, Z., … He, X. (2023). Theoretical insights into the solubility polarity switch of metal–organic nanoclusters for nanoscale patterning. Small Methods, 7(10), 2300309 (11 pp.). https://doi.org/10.1002/smtd.202300309
EUV resist screening update: progress towards High-NA lithography
Allenet, T., Vockenhuber, M., Yeh, C. K., Santaclara, J. G., van Lent-Protasova, L., Ekinci, Y., & Kazazis, D. (2022). EUV resist screening update: progress towards High-NA lithography. In D. P. Sanders & D. Guerrero (Eds.), Proceedings of SPIE: Vol. 12055. Advances in patterning materials and processes XXXIX (p. 120550F (10 pp.). https://doi.org/10.1117/12.2614171
Influence of counteranions on the performance of tin-based EUV photoresists
Evrard, Q., Sadegh, N., Ekinci, Y., Vockenhuber, M., Mahne, N., Giglia, A., … Brouwer, A. M. (2022). Influence of counteranions on the performance of tin-based EUV photoresists. Journal of Photopolymer Science and Technology, 35(1), 95-100. https://doi.org/10.2494/photopolymer.35.95
Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology
Kim, H. S., Nebling, R., Dejkameh, A., Shen, T., Ekinci, Y., & Mochi, I. (2022). Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology. Journal of Micro/Nanopatterning, Materials, and Metrology, 21(3), 34002 (12 PP.). https://doi.org/10.1117/1.JMM.21.3.034002
 

Pages