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  • (-) Funding (EC, SNSF) = Displacement Talbot Lithography for micro and nanopatterning
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High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch
Shi, Z., Jefimovs, K., Stampanoni, M., & Romano, L. (2023). High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch. Materials Science in Semiconductor Processing, 157, 107311 (12 pp.). https://doi.org/10.1016/j.mssp.2023.107311
Fabrication of X-ray gratings for interferometric imaging by conformal seedless gold electroplating
Jefimovs, K., Vila-Comamala, J., Arboleda, C., Wang, Z., Romano, L., Shi, Z., … Stampanoni, M. (2021). Fabrication of X-ray gratings for interferometric imaging by conformal seedless gold electroplating. Micromachines, 12(5), 517 (10 pp.). https://doi.org/10.3390/mi12050517
Towards clinical grating-interferometry mammography
Arboleda, C., Wang, Z., Jefimovs, K., Koehler, T., Van Stevendaal, U., Kuhn, N., … Stampanoni, M. (2020). Towards clinical grating-interferometry mammography. European Radiology, 30, 1419-1425. https://doi.org/10.1007/s00330-019-06362-x
Towards the fabrication of high-aspect-ratio silicon gratings by deep reactive ion etching
Shi, Z., Jefimovs, K., Romano, L., & Stampanoni, M. (2020). Towards the fabrication of high-aspect-ratio silicon gratings by deep reactive ion etching. Micromachines, 11(9), 864 (13 pp.). https://doi.org/10.3390/MI11090864
Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry
Kagias, M., Wang, Z., Guzenko, V. A., David, C., Stampanoni, M., & Jefimovs, K. (2019). Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry. Materials Science in Semiconductor Processing, 92, 73-79. https://doi.org/10.1016/j.mssp.2018.04.015