| Increasing the sensitivity of nonchemically amplified resists by oxime sulfonate-functionalized polystyrene
An, H., Chen, J., Zeng, Y., Yu, T., Wang, S., Guo, X., … Li, Y. (2024). Increasing the sensitivity of nonchemically amplified resists by oxime sulfonate-functionalized polystyrene. ACS Applied Polymer Materials, 6(9), 5374-5384. https://doi.org/10.1021/acsapm.4c00573 |
| Angle-resolved optical characterization of a plasmonic triangular array of elliptical holes in a gold layer
Angelini, M., Jefimovs, K., Pellacani, P., Kazazis, D., Marabelli, F., & Floris, F. (2024). Angle-resolved optical characterization of a plasmonic triangular array of elliptical holes in a gold layer. Optics, 5(1), 195-206. https://doi.org/10.3390/opt5010014 |
| EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning
Constantinou, P., Stock, T. J. Z., Tseng, L. T., Kazazis, D., Muntwiler, M., Vaz, C. A. F., … Schofield, S. R. (2024). EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning. Nature Communications, 15(1), 694 (13 pp.). https://doi.org/10.1038/s41467-024-44790-6 |
| Designing EUV negative tone resist and underlayer approaches exhibiting 14nm half-pitch resolution
Dang, L. N., Tseng, L. T., Rajak, A., Gädda, T., Laukkanen, M., Salunke, J., … Ekinci, Y. (2024). Designing EUV negative tone resist and underlayer approaches exhibiting 14nm half-pitch resolution. In D. Guerrero & G. R. Amblard (Eds.), Proceedings of SPIE - The international society for optical engineering: Vol. 12957. Advances in patterning materials and processes (p. 129570I). https://doi.org/10.1117/12.3014297 |
| Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration
Dejkameh, A., Nebling, R., Locans, U., Kim, H. S., Mochi, I., & Ekinci, Y. (2024). Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration. Ultramicroscopy, 258, 113912 (8 pp.). https://doi.org/10.1016/j.ultramic.2023.113912 |
| Extreme ultraviolet photoresponse of organotin-based photoresists with borate counteranions
Evrard, Q., Sadegh, N., Mathew, S., Zuidinga, E., Watts, B., Paradiz Dominguez, M., … Brouwer, A. M. (2024). Extreme ultraviolet photoresponse of organotin-based photoresists with borate counteranions. ACS Applied Materials and Interfaces, 16, 42947-42956. https://doi.org/10.1021/acsami.4c08636 |
| Effects of temporal coherence on EUV lensless imaging
Fernandez, S., Rajeev, R., Helfenstein, P., Kazazis, D., Ekinci, Y., & Mochi, I. (2024). Effects of temporal coherence on EUV lensless imaging. In M. J. Sendelbach & N. G. Schuch (Eds.), Proceedings of SPIE - The international society for optical engineering: Vol. 12955. Metrology, inspection, and process control (p. 129552Y). https://doi.org/10.1117/12.3010514 |
| Optimization strategy for epoxy cross-linked molecular glass photoresist in EUV lithography
Gao, J., Zhang, S., Cui, X., Cong, X., Guo, X., Hu, R., … Yang, G. (2024). Optimization strategy for epoxy cross-linked molecular glass photoresist in EUV lithography. Journal of Photochemistry and Photobiology A: Chemistry, 453, 115684. https://doi.org/10.1016/j.jphotochem.2024.115684 |
| Extreme ultraviolet lithography reaches 5 nm resolution
Giannopoulos, I., Mochi, I., Vockenhuber, M., Ekinci, Y., & Kazazis, D. (2024). Extreme ultraviolet lithography reaches 5 nm resolution. Nanoscale, 16(33), 15533-15543. https://doi.org/10.1039/d4nr01332h |
| Tailoring p-type behavior in ZnO quantum dots through enhanced sol-gel synthesis: mechanistic insights into zinc vacancies
Kahraman, A., Socie, E., Nazari, M., Kazazis, D., Buldu-Akturk, M., Kabanova, V., … Milne, C. (2024). Tailoring p-type behavior in ZnO quantum dots through enhanced sol-gel synthesis: mechanistic insights into zinc vacancies. Journal of Physical Chemistry Letters, 15, 1755-1764. https://doi.org/10.1021/acs.jpclett.3c03519 |
| Enhancing SEM image metrology with SMILE: advances, features, and portability
Mochi, I. (2024). Enhancing SEM image metrology with SMILE: advances, features, and portability. In M. J. Sendelbach & N. G. Schuch (Eds.), Proceedings of SPIE: Vol. 12955. Metrology, inspection, and process control XXXVIII (p. 129553C (10 pp.). https://doi.org/10.1117/12.3010966 |
| Three-dimensional microfluidic capillary device for rapid and multiplexed immunoassays in whole blood
Mortelmans, T., Marty, B., Kazazis, D., Padeste, C., Li, X., & Ekinci, Y. (2024). Three-dimensional microfluidic capillary device for rapid and multiplexed immunoassays in whole blood. ACS Sensors, 9(5), 2455-2464. https://doi.org/10.1021/acssensors.4c00153 |
| Nanofabrication process scale-up via displacement Talbot lithography of a plasmonic metasurface for sensing applications
Pellacani, P., Jefimovs, K., Angelini, M., Marabelli, F., Tolardo, V., Kazazis, D., & Floris, F. (2024). Nanofabrication process scale-up via displacement Talbot lithography of a plasmonic metasurface for sensing applications. Optics, 5(1), 165-175. https://doi.org/10.3390/opt5010012 |
| Heterometallic Ti-Zr oxo nanocluster photoresists for advanced lithography
Qiao, Y., Shi, G., Zhang, O., Li, Y., Vockenhuber, M., Ekinci, Y., … Zhang, L. (2024). Heterometallic Ti-Zr oxo nanocluster photoresists for advanced lithography. Science China - Materials. https://doi.org/10.1007/s40843-024-3013-9 |
| Approaching angstrom-scale resolution in lithography using low-molecular-mass resists (<500 Da)
Saifullah, M. S. M., Rajak, A. K., Hofhuis, K. A., Tiwale, N., Mahfoud, Z., Testino, A., … Ekinci, Y. (2024). Approaching angstrom-scale resolution in lithography using low-molecular-mass resists (<500 Da). ACS Nano, 18(35), 23827-24604. https://doi.org/10.1021/acsnano.4c03939 |
| EUV reflectometry and scatterometry for thin layer and periodic structure characterization
Shen, T., Mochi, I., Ansuinelli, P., Jeong, D., Ahn, J., & Ekinci, Y. (2024). EUV reflectometry and scatterometry for thin layer and periodic structure characterization. In M. J. Sendelbach & N. G. Schuch (Eds.), Proceedings of SPIE - The international society for optical engineering: Vol. 12955. Metrology, inspection, and process control (p. 129550D). https://doi.org/10.1117/12.3010875 |
| Towards fast ptychography image reconstruction of EUV masks by deep neural networks
Ansuinelli, P., Béjar Haro, B., Ekinci, Y., & Mochi, I. (2023). Towards fast ptychography image reconstruction of EUV masks by deep neural networks. In T. Liang (Ed.), Proceedings of SPIE - the international society for optical rngineering: Vol. 12751. Photomask technology (p. 127510Q (10 pp.). https://doi.org/10.1117/12.2685227 |
| The extent of platinum-induced hydrogen spillover on cerium dioxide
Beck, A., Kazazis, D., Ekinci, Y., Li, X., Müller Gubler, E. A., Kleibert, A., … van Bokhoven, J. A. (2023). The extent of platinum-induced hydrogen spillover on cerium dioxide. ACS Nano, 17(2), 1091-1099. https://doi.org/10.1021/acsnano.2c08152 |
| Advancements in EUV photoresists for high-NA lithography
Develioglu, A., Vockenhuber, M., Van Lent-Protasova, L., Mochi, I., Ekinci, Y., & Kazazis, D. (2023). Advancements in EUV photoresists for high-NA lithography. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE - the international society for optical engineering: Vol. 12750. International conference on extreme ultraviolet lithography (p. 1275008 (11 pp.). https://doi.org/10.1117/12.2686250 |
| The EUV lithography resist screening activities in H2-2022
Develioglu, A., Allenet, T. P., Vockenhuber, M., van Lent-Protasova, L., Mochi, I., Ekinci, Y., & Kazazis, D. (2023). The EUV lithography resist screening activities in H2-2022. In D. Guerrero & G. R. Amblard (Eds.), Proceedings of SPIE: Vol. 12498. Advances in patterning materials and processes XL (p. 1249805 (9 pp.). https://doi.org/10.1117/12.2660859 |
