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Progress in EUV resist screening towards the deployment of high-NA lithography
Allenet, T., Wang, X., Vockenhuber, M., Yeh, C. K., Mochi, I., Santaclara, J. G., … Ekinci, Y. (2021). Progress in EUV resist screening towards the deployment of high-NA lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090J (10 pp.). https://doi.org/10.1117/12.2583983
Chemically-amplified backbone scission (CABS) resist for EUV lithography.
Manouras, T., Kazazis, D., & Ekinci, Y. (2021). Chemically-amplified backbone scission (CABS) resist for EUV lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 11609H (9 pp.). https://doi.org/10.1117/12.2584085
Lensless EUV mask inspection for anamorphic patterns
Mochi, I., Kim, H. S., Dejkameh, A., Nebling, R., Dimitrios, K., Locans, U., … Ekinci, Y. (2021). Lensless EUV mask inspection for anamorphic patterns. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090M (6 pp.). https://doi.org/10.1117/12.2584518
Optimization of nanofluidic devices for geometry‐induced electrostatic trapping
Sharma, D., Lim, R. Y. H., Pfohl, T., & Ekinci, Y. (2021). Optimization of nanofluidic devices for geometry‐induced electrostatic trapping. Particle and Particle Systems Characterization, 38(2), 2000275 (9 pp.). https://doi.org/10.1002/ppsc.202000275
Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography
Dieleman, C. D., Ding, W., Wu, L., Thakur, N., Bespalov, I., Daiber, B., … Ehrler, B. (2020). Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography. Nanoscale, 12(20), 11306-11316. https://doi.org/10.1039/d0nr01077d
Electrically tunable filter based on plasmonic phase retarder and liquid crystals
Driencourt, L., Federspiel, F., Kazazis, D., Tseng, L. T., Frantz, R., Ekinci, Y., … Gallinet, B. (2020). Electrically tunable filter based on plasmonic phase retarder and liquid crystals. In C. J. Chang-Hasnain, A. Faraon, & W. Zhou (Eds.), Proceedings of SPIE: Vol. 11290. High contrast metastructures IX (p. 112901A (6 pp.). https://doi.org/10.1117/12.2543569
Electrically tunable multicolored filter using birefringent plasmonic resonators and liquid crystals
Driencourt, L., Federspiel, F., Kazazis, D., Tseng, L. T., Frantz, R., Ekinci, Y., … Gallinet, B. (2020). Electrically tunable multicolored filter using birefringent plasmonic resonators and liquid crystals. ACS Photonics, 7(2), 444-453. https://doi.org/10.1021/acsphotonics.9b01404
On architecture and performance of adaptive mesh refinement in an electrostatics Particle-In-Cell code
Frey, M., Adelmann, A., & Locans, U. (2020). On architecture and performance of adaptive mesh refinement in an electrostatics Particle-In-Cell code. Computer Physics Communications, 247, 106912 (18 pp.). https://doi.org/10.1016/j.cpc.2019.106912
Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning
Kazazis, D., Tseng, L. T., & Ekinci, Y. (2020). Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning. Microelectronic Engineering, 225, 111273 (7 pp.). https://doi.org/10.1016/j.mee.2020.111273
High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review
Kim, H., Locans, U., Nebling, R., Dejkameh, A., Kazazis, D., Ekinci, Y., & Mochi, I. (2020). High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180X (7 pp.). SPIE.
Anisotropic etching of pyramidal silica reliefs with metal masks and hydrofluoric acid
Kirchner, R., Neumann, V., Winkler, F., Strobel, C., Völkel, S., Hiess, A., … Bartha, J. W. (2020). Anisotropic etching of pyramidal silica reliefs with metal masks and hydrofluoric acid. Small, 16(43), 2002290 (7 pp.). https://doi.org/10.1002/smll.202002290
Illumination control in lensless imaging for EUV mask inspection and review
Mochi, I., Kim, H. S., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., & Ekinici, Y. (2020). Illumination control in lensless imaging for EUV mask inspection and review. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11323. Extreme ultraviolet (EUV) lithography XI (p. 113231I (9 pp.). https://doi.org/10.1117/12.2552014
Open-source software for SEM metrology
Mochi, I., Vockenhuber, M., Allenet, T., & Ekinci, Y. (2020). Open-source software for SEM metrology. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180G (10 pp.). SPIE.
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002
Grayscale e-beam lithography: effects of a delayed development for well-controlled 3D patterning
Mortelmans, T., Kazazis, D., Guzenko, V. A., Padeste, C., Braun, T., Li, X., & Ekinci, Y. (2020). Grayscale e-beam lithography: effects of a delayed development for well-controlled 3D patterning. Microelectronic Engineering, 225, 111272 (5 pp.). https://doi.org/10.1016/j.mee.2020.111272
Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging
Nebling, R., Kim, H. S., Locans, U., Dejkameh, A., Ekinci, Y., & Mochi, I. (2020). Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11517. Extreme Ultraviolet Lithography 2020 (p. 115170W (6 pp.). https://doi.org/10.1117/12.2573181
Laser repair and clean of extreme ultraviolet lithography photomasks
Robinson, T., LeClaire, J., Mochi, I., Nebling, R. M., Ekinci, Y., & Kazazis, D. (2020). Laser repair and clean of extreme ultraviolet lithography photomasks. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 1151809 (15 pp.). SPIE.
Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics
Romano, L., Kagias, M., Vila-Comamala, J., Jefimovs, K., Tseng, L. T., Guzenko, V. A., & Stampanoni, M. (2020). Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics. Nanoscale Horizons, 5(5), 869-879. https://doi.org/10.1039/C9NH00709A
Nanolithographic top-down patterning of polyoxovanadate‐based nanostructures with switchable electrical resistivity
Rösner, B., Fallica, R., Johnson, M., Späth, A., Fink, R., Ekinci, Y., … Streb, C. (2020). Nanolithographic top-down patterning of polyoxovanadate‐based nanostructures with switchable electrical resistivity. ChemNanoMat, 6(11), 1620-1624. https://doi.org/10.1002/cnma.202000425
Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography
Thakur, N., Bliem, R., Mochi, I., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2020). Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography. Journal of Materials Chemistry C, 8(41), 14499-14506. https://doi.org/10.1039/d0tc03597a
 

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