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High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers
Wang, X., Kazazis, D., Tseng, L. T., Robinson, A. P. G., & Ekinci, Y. (2022). High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers. Nanotechnology, 33(6), 065301 (10 pp.). https://doi.org/10.1088/1361-6528/ac328b
From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography
Allenet, T., Mortelmans, T., Vockenhuber, M., Yeh, C. K., & Ekinci, Y. (2021). From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography. In T. Allenet, T. Mortelmans, M. Vockenhuber, C. K. Yeh, Y. Ekinci, K. G. Ronse, … E. Hendrickx (Eds.), Proceedings of SPIE: Vol. 11854. International conference on extreme ultraviolet lithography 2021 (p. 1185417 (8 pp.). https://doi.org/10.1117/12.2600920
Progress in EUV resist screening by interference lithography for high-NA lithography
Allenet, T., Vockenhuber, M., Yeh, C. K., Kazazis, D., Santaclara, J. G., van Lent-Protasova, L., & Ekinci, Y. (2021). Progress in EUV resist screening by interference lithography for high-NA lithography. In T. Allenet, M. Vockenhuber, C. K. Yeh, D. Kazazis, J. Garcia-Santaclara, L. van Lent-Protasova, … E. Hendrickx (Eds.), Proceedings of SPIE: Vol. 11854. International conference on extreme ultraviolet lithography 2021 (p. 118540N (10 pp.). https://doi.org/10.1117/12.2600963
Progress in EUV resist screening towards the deployment of high-NA lithography
Allenet, T., Wang, X., Vockenhuber, M., Yeh, C. K., Mochi, I., Santaclara, J. G., … Ekinci, Y. (2021). Progress in EUV resist screening towards the deployment of high-NA lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090J (10 pp.). https://doi.org/10.1117/12.2583983
Resolution limit and photon flux dependency in EUV ptychography 
Kim, H., Nebling, R., Dejkameh, A., Tao, S., Mochi, I., & Ekinci, Y. (2021). Resolution limit and photon flux dependency in EUV ptychography . In Kim, Nebling, Dejkameh, Tao, Iacopo, Yasin, & S. P. Renwick (Eds.), Proceedings of SPIE: Vol. 11855. Photomask technology 2021 (p. 1185506 (8 pp.). https://doi.org/10.1117/12.2601246
Bottom-up nanofabrication with extreme-ultraviolet light: metal-organic frameworks on patterned monolayers
Lugier, O., Thakur, N., Wu, L., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2021). Bottom-up nanofabrication with extreme-ultraviolet light: metal-organic frameworks on patterned monolayers. ACS Applied Materials and Interfaces, 13(36), 43777-43786. https://doi.org/10.1021/acsami.1c13667
Chemically-amplified backbone scission (CABS) resist for EUV lithography.
Manouras, T., Kazazis, D., & Ekinci, Y. (2021). Chemically-amplified backbone scission (CABS) resist for EUV lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 11609H (9 pp.). https://doi.org/10.1117/12.2584085
Contacts and lines SEM image metrology with SMILE
Mochi, I., Vockenhuber, M., Allenet, T., & Ekinci, Y. (2021). Contacts and lines SEM image metrology with SMILE. In S. P. Renwick (Ed.), Proceedings of SPIE: Vol. 11855. Photomask technology 2021 (p. 1185502 (8 pp.). https://doi.org/10.1117/12.2600911
Lensless EUV mask inspection for anamorphic patterns
Mochi, I., Kim, H. S., Dejkameh, A., Nebling, R., Kazazis, D., Locans, U., … Ekinci, Y. (2021). Lensless EUV mask inspection for anamorphic patterns. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090M (6 pp.). https://doi.org/10.1117/12.2584518
Fabrication of high aspect ratio and tilted nanostructures using extreme ultraviolet and soft x-ray interference lithography
Mojarad, N., Kazazis, D., & Ekinci, Y. (2021). Fabrication of high aspect ratio and tilted nanostructures using extreme ultraviolet and soft x-ray interference lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 39(4), 042601 (7 pp.). https://doi.org/10.1116/6.0001089
A priori information in ptychographic image reconstruction for EUV mask metrology
Nebling, R., Mochi, I., Kim, Hsu, Dejkameh, A., Shen, T., & Ekinci, Y. (2021). A priori information in ptychographic image reconstruction for EUV mask metrology. In R. Nebling, I. Mochi, Hsu Kim, A. Dejkameh, T. Shen, Y. Ekinci, … A. Erdmann (Eds.), Proceedings of SPIE: Vol. 11875. Computational optics 2021 (p. 118750M (8 pp.). https://doi.org/10.1117/12.2600233
Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks
Robinson, T., Leclaire, J., Mochi, I., Nebling, R. M., Ekinci, Y., & Kazazis, D. (2021). Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks. In A. Ando (Ed.), Proceedings of SPIE: Vol. 11908. Photomask Japan 2021: XXVII symposium on photomask and next-generation lithography mask technology (p. 119080O (13 pp.). https://doi.org/10.1117/12.2601395
Optimization of nanofluidic devices for geometry‐induced electrostatic trapping
Sharma, D., Lim, R. Y. H., Pfohl, T., & Ekinci, Y. (2021). Optimization of nanofluidic devices for geometry‐induced electrostatic trapping. Particle and Particle Systems Characterization, 38(2), 2000275 (9 pp.). https://doi.org/10.1002/ppsc.202000275
Surface-modified elastomeric nanofluidic devices for single nanoparticle trapping
Sharma, D., Lim, R. Y. H., Pfohl, T., & Ekinci, Y. (2021). Surface-modified elastomeric nanofluidic devices for single nanoparticle trapping. Microsystems and Nanoengineering, 7(1), 46 (12 pp.). https://doi.org/10.1038/s41378-021-00273-y
Fluorescent labeling to investigate nanopatterning processes in extreme ultraviolet lithography
Wu, L., Hilbers, M. F., Lugier, O., Thakur, N., Vockenhuber, M., Ekinci, Y., … Castellanos, S. (2021). Fluorescent labeling to investigate nanopatterning processes in extreme ultraviolet lithography. ACS Applied Materials and Interfaces, 13(43), 51790-51798. https://doi.org/10.1021/acsami.1c16257
A new characterization approach to study the mechanical behavior of silicon nanowires
Zare Pakzad, S., Nasr Esfahani, M., Tasdemir, Z., Wollschlaeger, N., Li, X. F., Li, T., … Alaca, B. E. (2021). A new characterization approach to study the mechanical behavior of silicon nanowires. MRS Advances, 6(19), 500-505. https://doi.org/10.1557/s43580-021-00117-x
Image blur investigation using EUV-interference lithography
Allenet, T., Santaclara, J. G., Rispens, G., Geh, B., & Ekinci, Y. (2020). Image blur investigation using EUV-interference lithography. In T. Allenet, J. Garcia-Santaclara, G. Rispens, B. Geh, Y. Ekinci, P. P. Naulleau, … K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11517. Extreme ultraviolet lithography 2020 (p. 115170J (9 pp.). https://doi.org/10.1117/12.2573126
Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography
Dieleman, C. D., Ding, W., Wu, L., Thakur, N., Bespalov, I., Daiber, B., … Ehrler, B. (2020). Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography. Nanoscale, 12(20), 11306-11316. https://doi.org/10.1039/d0nr01077d
Real- and <em>Q</em>-space travelling: multi-dimensional distribution maps of crystal-lattice strain <em>(∊</em><sub>044</sub>) and tilt of suspended monolithic silicon nanowire structures
Dolabella, S., Frison, R., Chahine, G. A., Richter, C., Schulli, T. U., Tasdemir, Z., … Neels, A. (2020). Real- and Q-space travelling: multi-dimensional distribution maps of crystal-lattice strain (∊044) and tilt of suspended monolithic silicon nanowire structures. Journal of Applied Crystallography, 53, 58-68. https://doi.org/10.1107/S1600576719015504
Electrically tunable filter based on plasmonic phase retarder and liquid crystals
Driencourt, L., Federspiel, F., Kazazis, D., Tseng, L. T., Frantz, R., Ekinci, Y., … Gallinet, B. (2020). Electrically tunable filter based on plasmonic phase retarder and liquid crystals. In C. J. Chang-Hasnain, A. Faraon, & W. Zhou (Eds.), Proceedings of SPIE: Vol. 11290. High contrast metastructures IX (p. 112901A (6 pp.). https://doi.org/10.1117/12.2543569
 

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