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Plasmonic nanostructures made from aluminum fabricated by EUV interference lithography
Ekinci, Y., Solak, H. H., David, C., & Löffler, J. F. (2007). Plasmonic nanostructures made from aluminum fabricated by EUV interference lithography. In L. Dong, Y. Katagiri, E. Higurashi, H. Toshiyoshi, & Y. A. Peter (Eds.), Proceedings of SPIE: Vol. 6717. Optomechatronic micro/nano devices and components III (p. 67170P (8 pp.). https://doi.org/10.1117/12.754350
Engineering gold nanoantennae to enhance the emission of quantum emitters
Agio, M., Mori, G., Kaminski, F., Rogobete, L., Kühn, S., Callegari, V., … Sandoghdar, V. (2007). Engineering gold nanoantennae to enhance the emission of quantum emitters. In L. Dong, Y. Katagiri, E. Higurashi, H. Toshiyoshi, & Y. A. Peter (Eds.), Proceedings of SPIE: Vol. 6717. Optomechatronic micro/nano devices and components III (p. 67170R (9 pp.). https://doi.org/10.1117/12.754367
Evaluation of EUV resist materials for use at the 32 nm half-pitch node
Wallow, T., Higgins, C., Brainard, R., Petrillo, K., Montgomery, W., Koay, Cseng, … Wei, Y. (2008). Evaluation of EUV resist materials for use at the 32 nm half-pitch node. In F. M. Schellenberg (Ed.), Proceedings of SPIE: Vol. 6921. Emerging lithographic technologies XII (p. 69211F (11 pp.). https://doi.org/10.1117/12.772943
Fresnel zone plates made by holography in the extreme ultraviolet region
Sarkar, S. S., Sahoo, P. K., Solak, H. H., David, C., & van der Veen, J. F. (2009). Fresnel zone plates made by holography in the extreme ultraviolet region. In Journal of physics: conference series: Vol. 186. 9th international conference on X-ray microscopy (p. 012071 (3 pp.). https://doi.org/10.1088/1742-6596/186/1/012071
Extreme ultraviolet interference lithography for generation of platinum nanoparticles on glassy carbon
Savouchkina, A., Foelske-Schmitz, A., Kötz, R., Wokaun, A., Scherer, G. G., Padeste, C., … Solak, H. H. (2010). Extreme ultraviolet interference lithography for generation of platinum nanoparticles on glassy carbon. C. Bock, J. Li, & E. Traversa (Eds.), ECS transactions: Vol. 25. (pp. 175-184). Presented at the 216th meeting of the electrochemical society. https://doi.org/10.1149/1.3316124
Measuring resist-induced contrast loss using EUV interference lithography
Langner, A., Solak, H. H., Gronheid, R., van Setten, E., Auzelyte, V., Ekinci, Y., … Feenstra, K. (2010). Measuring resist-induced contrast loss using EUV interference lithography. In B. M. La Fontaine (Ed.), Proceedings of SPIE: Vol. 7636. Extreme Ultraviolet (EUV) Lithography (p. 76362X (11 pp.). https://doi.org/10.1117/12.846495
Advanced holographic methods in extreme ultraviolet interference lithography
Terhalle, B., Langner, A., Päivänranta, B., & Ekinci, Y. (2011). Advanced holographic methods in extreme ultraviolet interference lithography. In E. A. Dobisz & L. A. Eldada (Eds.), Proceedings of SPIE: Vol. 8102. Nanoengineering: fabrication, properties, optics, and devices VIII (p. 81020V (7 pp.). https://doi.org/10.1117/12.893733
Positive tone chemically amplified fullerene resist
Manyam, J., Frommhold, A., Yang, D. X., McClelland, A., Manickam, M., Preece, J. A., … Robinson, A. P. G. (2012). Positive tone chemically amplified fullerene resist. In M. H. Somervell & T. I. Wallow (Eds.), Proceedings of SPIE: Vol. 8325. Advances in resist materials and processing technology XXIX (p. 83251U (9 pp.). https://doi.org/10.1117/12.916472
Strong magnetism by closely-spaced gold nanohoops
Lorente-Crespo, M., Ortuño, R., Alepuz-Benaches, I., García-Meca, C., Wang, L., Ekinci, Y., & Martínez, A. (2012). Strong magnetism by closely-spaced gold nanohoops. In A. D. Boardman, N. P. Johnson, & R. W. Ziolkowski (Eds.), Proceedings of SPIE: Vol. 8423. Metamaterials VII (p. 84231V (6 pp.). https://doi.org/10.1117/12.921801
High performance Al bi-layer wire-grid polarizer for deep-ultraviolet to infrared: modeling and design
Wang, L., Solak, H. H., & Ekinci, Y. (2012). High performance Al bi-layer wire-grid polarizer for deep-ultraviolet to infrared: modeling and design. In D. L. Andrews, J. M. Nunzi, & N. Ostendorf (Eds.), Proceedings of SPIE: Vol. 8424. Nanophotonics IV (p. 842429 (8 pp.). https://doi.org/10.1117/12.921837
Fano resonant plasmonic systems: functioning principles and applications
Gallinet, B., Lovera, A., Siegfried, T., Sigg, H., & Martin, O. J. F. (2012). Fano resonant plasmonic systems: functioning principles and applications. In D. N. Chigrin (Ed.), AIP conference proceedings: Vol. 1475. Fifth international workshop on theoretical and computational nano-photonics. Tacona-photonics 2012 (pp. 18-20). https://doi.org/10.1063/1.4750081
Minimizing quenching of plasmonic sensors caused by adhesion layers
Siegfried, T., Ekinci, Y., Solak, H., Martin, O. J. F., & Sigg, H. (2012). Minimizing quenching of plasmonic sensors caused by adhesion layers. In 2012 conference on lasers and electro-optics. (CLEO 2012) (p. QM3H.7 (2 pp.). https://doi.org/10.1364/QELS.2012.QM3H.7
Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching
Frommhold, A., Yang, D. X., Manyam, J., Manickam, M., Tarte, E., Preece, J. A., … Robinson, A. P. G. (2012). Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching. In IEEE conference on nanotechnology. 2012 12th IEEE international conference on nanotechnology. IEEE NANO. 20-23 August 2012. International convention centre, Birmingham, UK (p. 6322209 (6 pp.). https://doi.org/10.1109/NANO.2012.6322209
Large area periodic nanogap arrays for Raman and fluorescence enhancement: modeling and performance
Siegfried, T., Ekinci, Y., Solak, H., Martin, O. J. F., & Sigg, H. (2012). Large area periodic nanogap arrays for Raman and fluorescence enhancement: modeling and performance. In 2012 conference on lasers and electro-optics. (CLEO 2012) (p. QM3H.3 (2 pp.). https://doi.org/10.1364/QELS.2012.QM3H.3
Evaluation of resist performance with EUV interference lithography for sub-22 nm patterning
Ekinci, Y., Vockenhuber, M., Terhalle, B., Hojeij, M., Wang, L., & Younkin, T. R. (2012). Evaluation of resist performance with EUV interference lithography for sub-22 nm patterning. In P. P. Naulleau & O. R. Wood II (Eds.), Proceedings of SPIE: Vol. 8322. Extreme Ultraviolet (EUV) Lithography III (p. 83220W (11 pp.). https://doi.org/10.1117/12.916541
Bilayer wire-grid polarizers for DUV to IR fabricated using EUV interference and nanoimprint lithography
Wang, L., Schift, H., Kristiansen, P. M., Jefimovs, K., Solak, H. H., Gobrecht, J., & Ekinci, Y. (2013). Bilayer wire-grid polarizers for DUV to IR fabricated using EUV interference and nanoimprint lithography. In IEEE international conference on nano/micro engineered and molecular systems (NEMS). IEEE NEMS2013. The 8th annual IEEE international conference on nano/micro engineered and molecular systems (pp. 1232-1235). https://doi.org/10.1109/NEMS.2013.6559941
Extreme UV interference lithography: progress and prospects
Ekinci, Y. (2013). Extreme UV interference lithography: progress and prospects. SPIE Newsroom, 6687 (3 pp.). https://doi.org/10.1117/2.1201306.004958
Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond
Ekinci, Y., Vockenhuber, M., Hojeij, M., Wang, L., & Mojarad, N. (2013). Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond. In P. P. Naulleau (Ed.), Proceedings of SPIE: Vol. 8679. Extreme ultraviolet (EUV) lithography IV (p. 867910 (11 pp.). https://doi.org/10.1117/12.2011533
Patterning at 6.5 nm wavelength using interference lithography
Mojarad, N., Vockenhuber, M., Wang, L., Terhalle, B., & Ekinci, Y. (2013). Patterning at 6.5 nm wavelength using interference lithography. In P. P. Naulleau (Ed.), Proceedings of SPIE: Vol. 8679. Extreme ultraviolet (EUV) lithography IV (p. 867924 (7 pp.). https://doi.org/10.1117/12.2011556
Ultra-dense silicon nanowires using extreme ultraviolet interference lithography
Fan, D., Sigg, H., Gobrecht, J., Ekinci, Y., & Spolenak, R. (2014). Ultra-dense silicon nanowires using extreme ultraviolet interference lithography. In P. Kallio (Ed.), 2014 international conference on manipulation, manufacturing and measurement on the nanoscale (3M-NANO). Conference proceedings (pp. 122-125). https://doi.org/10.1109/3M-NANO.2014.7057336
 

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