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Progress in EUV resist screening towards the deployment of high-NA lithography
Allenet, T., Wang, X., Vockenhuber, M., Yeh, C. K., Mochi, I., Santaclara, J. G., … Ekinci, Y. (2021). Progress in EUV resist screening towards the deployment of high-NA lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090J (10 pp.). https://doi.org/10.1117/12.2583983
Chemically-amplified backbone scission (CABS) resist for EUV lithography.
Manouras, T., Kazazis, D., & Ekinci, Y. (2021). Chemically-amplified backbone scission (CABS) resist for EUV lithography. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 11609H (9 pp.). https://doi.org/10.1117/12.2584085
Lensless EUV mask inspection for anamorphic patterns
Mochi, I., Kim, H. S., Dejkameh, A., Nebling, R., Dimitrios, K., Locans, U., … Ekinci, Y. (2021). Lensless EUV mask inspection for anamorphic patterns. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11609. Extreme ultraviolet (EUV) lithography XII (p. 116090M (6 pp.). https://doi.org/10.1117/12.2584518
Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography
Dieleman, C. D., Ding, W., Wu, L., Thakur, N., Bespalov, I., Daiber, B., … Ehrler, B. (2020). Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography. Nanoscale, 12(20), 11306-11316. https://doi.org/10.1039/d0nr01077d
Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning
Kazazis, D., Tseng, L. T., & Ekinci, Y. (2020). Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning. Microelectronic Engineering, 225, 111273 (7 pp.). https://doi.org/10.1016/j.mee.2020.111273
High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review
Kim, H., Locans, U., Nebling, R., Dejkameh, A., Kazazis, D., Ekinci, Y., & Mochi, I. (2020). High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180X (7 pp.). SPIE.
Illumination control in lensless imaging for EUV mask inspection and review
Mochi, I., Kim, H. S., Locans, U., Dejkameh, A., Nebling, R., Kazazis, D., & Ekinici, Y. (2020). Illumination control in lensless imaging for EUV mask inspection and review. In N. M. Felix & A. Lio (Eds.), Proceedings of SPIE: Vol. 11323. Extreme ultraviolet (EUV) lithography XI (p. 113231I (9 pp.). https://doi.org/10.1117/12.2552014
Open-source software for SEM metrology
Mochi, I., Vockenhuber, M., Allenet, T., & Ekinci, Y. (2020). Open-source software for SEM metrology. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 115180G (10 pp.). SPIE.
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002
Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging
Nebling, R., Kim, H. S., Locans, U., Dejkameh, A., Ekinci, Y., & Mochi, I. (2020). Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging. In P. P. Naulleau, P. A. Gargini, T. Itani, & K. G. Ronse (Eds.), Proceedings of SPIE: Vol. 11517. Extreme Ultraviolet Lithography 2020 (p. 115170W (6 pp.). https://doi.org/10.1117/12.2573181
Laser repair and clean of extreme ultraviolet lithography photomasks
Robinson, T., LeClaire, J., Mochi, I., Nebling, R. M., Ekinci, Y., & Kazazis, D. (2020). Laser repair and clean of extreme ultraviolet lithography photomasks. In M. E. Preil (Ed.), Proceedings of SPIE: Vol. 11518. Photomask technology 2020 (p. 1151809 (15 pp.). SPIE.
Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography
Thakur, N., Bliem, R., Mochi, I., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2020). Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography. Journal of Materials Chemistry C, 8(41), 14499-14506. https://doi.org/10.1039/d0tc03597a
Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy
Wu, L., Bespalov, I., Witte, K., Lugier, O., Haitjema, J., Vockenhuber, M., … Castellanos, S. (2020). Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy. Journal of Materials Chemistry C, 8(42), 14757-14765. https://doi.org/10.1039/d0tc03216f
Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect
Fallica, R. (2019). Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect. Advanced Optical Technologies, 8(3-4), 233-240. https://doi.org/10.1515/aot-2019-0005
Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging
Fernandez, S., Kazazis, D., Rajendran, R., Mochi, I., Helfenstein, P., Yoshitake, S., & Ekinci, Y. (2019). Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 013506 (6 pp.). https://doi.org/10.1117/1.JMM.18.1.013506
Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution
Gädda, T., Luong, N. D., Laukkanen, M., Karaste, K., Kähkönen, O., Kauppi, E., … Rantala, J. (2019). Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution. In R. Gronheid & D. P. Sanders (Eds.), Proceedings of SPIE: Vol. 10960. Advances in patterning materials and processes XXXVI (p. 109600B (7 pp.). https://doi.org/10.1117/12.2515600
Absorber and phase defect inspection on EUV reticles using RESCAN
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Helfenstein, P., Rajeev, R., … Ekinci, Y. (2019). Absorber and phase defect inspection on EUV reticles using RESCAN. In K. A. Goldberg (Ed.), Proceedings of SPIE: Vol. 10957. Extreme Ultraviolet (EUV) lithography X (p. 109570W (8 pp.). https://doi.org/10.1117/12.2515160
Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging
Mochi, I., Timmermans, M. Y., Gallagher, E. E., Mariano, M., Pollentier, I., Rajendran, R., … Ekinci, Y. (2019). Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 18(1), 014002 (7 pp.). https://doi.org/10.1117/1.JMM.18.1.014002
Lensless EUV lithography and imaging
Mochi, I., & Ekinci, Y. (2019). Lensless EUV lithography and imaging. Synchrotron Radiation News, 32(4), 22-27. https://doi.org/10.1080/08940886.2019.1634433
Lensless metrology for semiconductor lithography at EUV
Mochi, I., Kazazis, D., Tseng, L. T., Fernandez, S., Rajeev, R., Locans, U., … Ekinci, Y. (2019). Lensless metrology for semiconductor lithography at EUV. In B. Bodermann, K. Frenner, & R. M. Silver (Eds.), Proceedings of SPIE: Vol. 11057. Modeling aspects in optical metrology VII (p. 1105703 (7 pp.). https://doi.org/10.1117/12.2534350
 

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