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Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration
Dejkameh, A., Nebling, R., Locans, U., Kim, H. S., Mochi, I., & Ekinci, Y. (2024). Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration. Ultramicroscopy, 258, 113912 (8 pp.). https://doi.org/10.1016/j.ultramic.2023.113912
Understanding and control of polymer distribution in photoresists using liquid chromatography for enhanced lithography performance
Im, K., Lee, C. H., Kim, M., Giannopoulos, I., Kazazis, D., Ekinci, Y., & Kwak, Y. (2023). Understanding and control of polymer distribution in photoresists using liquid chromatography for enhanced lithography performance. ACS Applied Polymer Materials, 5(12), 10091-10096. https://doi.org/10.1021/acsapm.3c01953
Resistless EUV lithography: photon-induced oxide patterning on silicon
Tseng, L. T., Karadan, P., Kazazis, D., Constantinou, P. C., Stock, T. J. Z., Curson, N. J., … Ekinci, Y. (2023). Resistless EUV lithography: photon-induced oxide patterning on silicon. Science Advances, 9(16), eadf5997 (10 pp.). https://doi.org/10.1126/sciadv.adf5997
Nonchemically amplified molecular resists based on sulfonium-functionalized sulfone derivatives for sub-13 nm nanolithography
Wang, Y., Chen, J., Zeng, Y., Yu, T., Wang, S., Guo, X., … Li, Y. (2023). Nonchemically amplified molecular resists based on sulfonium-functionalized sulfone derivatives for sub-13 nm nanolithography. ACS Applied Nano Materials, 6(19), 18480-18490. https://doi.org/10.1021/acsanm.3c03900
Sulfonium-functionalized polystyrene-based nonchemically amplified resists enabling sub-13 nm nanolithography
Wang, Z., Chen, J., Yu, T., Zeng, Y., Guo, X., Wang, S., … Li, Y. (2023). Sulfonium-functionalized polystyrene-based nonchemically amplified resists enabling sub-13 nm nanolithography. ACS Applied Materials and Interfaces, 15(1), 2289-2300. https://doi.org/10.1021/acsami.2c19940
Suppressing of secondary electron diffusion for high-precision nanofabrication
Wang, Q., Zhou, Y., Wang, X., Gao, H., Shu, Z., Hu, Z., … He, X. (2023). Suppressing of secondary electron diffusion for high-precision nanofabrication. Materials Today, 67, 95-105. https://doi.org/10.1016/j.mattod.2023.06.005
Theoretical insights into the solubility polarity switch of metal–organic nanoclusters for nanoscale patterning
Wang, Q., Vockenhuber, M., Cui, H., Wang, X., Tao, P., Hu, Z., … He, X. (2023). Theoretical insights into the solubility polarity switch of metal–organic nanoclusters for nanoscale patterning. Small Methods, 7(10), 2300309 (11 pp.). https://doi.org/10.1002/smtd.202300309
Influence of counteranions on the performance of tin-based EUV photoresists
Evrard, Q., Sadegh, N., Ekinci, Y., Vockenhuber, M., Mahne, N., Giglia, A., … Brouwer, A. M. (2022). Influence of counteranions on the performance of tin-based EUV photoresists. Journal of Photopolymer Science and Technology, 35(1), 95-100. https://doi.org/10.2494/photopolymer.35.95
Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology
Kim, H. S., Nebling, R., Dejkameh, A., Shen, T., Ekinci, Y., & Mochi, I. (2022). Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology. Journal of Micro/Nanopatterning, Materials, and Metrology, 21(3), 34002 (12 PP.). https://doi.org/10.1117/1.JMM.21.3.034002
Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography
Lewis, S. M., Alty, H. R., Vockenhuber, M., DeRose, G. A., Fernandez-Mato, A., Kazazis, D., … Winpenny, R. E. P. (2022). Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography. Journal of Micro/Nanopatterning, Materials, and Metrology, 21(4), 041404 (9 pp.). https://doi.org/10.1117/1.JMM.21.4.041404
Charge configuration memory devices: energy efficiency and switching speed
Mraz, A., Venturini, R., Svetin, D., Sever, V., Mihailovic, I. A., Vaskivskyi, I., … Mihailovic, D. (2022). Charge configuration memory devices: energy efficiency and switching speed. Nano Letters, 22(12), 4814-4821. https://doi.org/10.1021/acs.nanolett.2c01116
Fluorine-rich zinc oxoclusters as extreme ultraviolet photoresists: chemical reactions and lithography performance
Thakur, N., Vockenhuber, M., Ekinci, Y., Watts, B., Giglia, A., Mahne, N., … Brouwer, A. M. (2022). Fluorine-rich zinc oxoclusters as extreme ultraviolet photoresists: chemical reactions and lithography performance. ACS Materials Au, 2(3), 343-355. https://doi.org/10.1021/acsmaterialsau.1c00059
High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers
Wang, X., Kazazis, D., Tseng, L. T., Robinson, A. P. G., & Ekinci, Y. (2022). High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers. Nanotechnology, 33(6), 065301 (10 pp.). https://doi.org/10.1088/1361-6528/ac328b
Molecular glass resists based on tetraphenylsilane derivatives: effect of protecting ratios on advanced lithography
Wang, Y., Chen, J., Zeng, Y., Yu, T., Guo, X., Wang, S., … Li, Y. (2022). Molecular glass resists based on tetraphenylsilane derivatives: effect of protecting ratios on advanced lithography. ACS Omega, 7(33), 29266-29273. https://doi.org/10.1021/acsomega.2c03445
Bottom-up nanofabrication with extreme-ultraviolet light: metal-organic frameworks on patterned monolayers
Lugier, O., Thakur, N., Wu, L., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2021). Bottom-up nanofabrication with extreme-ultraviolet light: metal-organic frameworks on patterned monolayers. ACS Applied Materials and Interfaces, 13(36), 43777-43786. https://doi.org/10.1021/acsami.1c13667
Fabrication of high aspect ratio and tilted nanostructures using extreme ultraviolet and soft x-ray interference lithography
Mojarad, N., Kazazis, D., & Ekinci, Y. (2021). Fabrication of high aspect ratio and tilted nanostructures using extreme ultraviolet and soft x-ray interference lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 39(4), 042601 (7 pp.). https://doi.org/10.1116/6.0001089
Fluorescent labeling to investigate nanopatterning processes in extreme ultraviolet lithography
Wu, L., Hilbers, M. F., Lugier, O., Thakur, N., Vockenhuber, M., Ekinci, Y., … Castellanos, S. (2021). Fluorescent labeling to investigate nanopatterning processes in extreme ultraviolet lithography. ACS Applied Materials and Interfaces, 13(43), 51790-51798. https://doi.org/10.1021/acsami.1c16257
Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography
Dieleman, C. D., Ding, W., Wu, L., Thakur, N., Bespalov, I., Daiber, B., … Ehrler, B. (2020). Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography. Nanoscale, 12(20), 11306-11316. https://doi.org/10.1039/d0nr01077d
Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning
Kazazis, D., Tseng, L. T., & Ekinci, Y. (2020). Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning. Microelectronic Engineering, 225, 111273 (7 pp.). https://doi.org/10.1016/j.mee.2020.111273
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Mochi, I., Fernandez, S., Nebling, R., Locans, U., Rajeev, R., Dejkameh, A., … Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography, MEMS, and MOEMS, 19(1), 014002 (11 pp.). https://doi.org/10.1117/1.JMM.19.1.014002
 

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